Mitsubishi Chemical Corporation

Mitsubishi Engineering-Plastics Corporation

Hiroyuki Tajima

Takeshi Nakamura

Yuuta Kumano

Toshiki Monden

Toshiyuki Tajiri

Tatsuya Kikuchi

Morio Tsunoda

Takafumi Yoshino

A method for producing a polycarbonate resin composition pellet with a twin screw extruder, the polycarbonate resin composition pellet has 30 to 95 mass % of a resin pellet (A) containing more than 40 mass % of a polycarbonate resin in the pellet; not less than 5 mass % and less than 40 mass % of a phosphate ester flame retardant (B) that is a liquid at room temperature; 0 to 50 mass % of polycarbonate resin flake (C); 0 to 30 mass % of an ABS resin (D); and 0 to 15 mass % of an additive (E) other than component (B). The method includes feeding components (A), (C), (D) and (E) in a twin screw extruder and kneading with a first kneading zone; feeding component (B) to a downstream part in the first kneading zone and kneading with a second kneading zone; and decompressing a vent in the downstream part in the second kneading zone.

Method for producing flame retardant polycarbonate resin composition pellet

There is provided a cover for a millimeter-wave radar, the cover being provided on an antenna that transmits and/or receives a millimeter wave of 75 to 81 GHz, the cover containing a thermoplastic resin composition that contains an aromatic polycarbonate resin having a structural unit (A) represented by formula (1) below, the cover having a relative dielectric constant εof 3.0 or less, a dielectric loss tangent tan δ of 8.0×10or less, and a loss factor ε·tan δ of 17.0×10or less:

Cover for millimeter-wave radar and millimeter-wave radar module including the same

The present invention provides a polycarbonate resin composition which exhibits high surface hardness and excellent abrasion resistance and transparency, which does not suffer from whitening during molding, and which exhibits excellent thin wall moldability. A polycarbonate resin composition containing, relative to 100 parts by mass of (A) a polycarbonate resin containing a polycarbonate resin having a structural unit represented by general formula (1) below, 

Polycarbonate resin composition and molded article thereof

Disclosed is an electrophotographic photoreceptor which is excellent in wear resistance and electrical characteristics. Specifically disclosed is an electrophotographic photoreceptor containing a polyester resin in a photosensitive layer provided on an electroconductive substrate. The polyester resin is composed of a copolymer represented by the general formula 1 below, which has a viscosity average molecular weight (Mv) of 10,000-300,000 and contains a diphenyl ether 4,4'-dicarboxylic acid component and a bivalent phenol component. In the general formula 1, A represents a diphenyl ether 4,4&#x2032;-dicarboxylic acid residue represented by the formula A below, and B represents a bivalent phenol residue represented by the formula B below. In the formula A, each of Raand Raindependently represents a hydrogen atom or a monovalent substituent which may have a substituent, and each of n and m is independently an integer from 0 to 4. In the formula B, each of Rand Rindependently represents one selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, a halogen group, and an alkoxy group.

Electrophotographic photoreceptor

Disclosed is an electrophotographic photoreceptor which is excellent in wear resistance and electrical characteristics. Specifically disclosed is an electrophotographic photoreceptor containing a polyester resin in a photosensitive layer provided on an electroconductive substrate. The polyester resin is composed of a copolymer represented by the general formula 1 below, which has a viscosity average molecular weight (Mv) of 10,000-300,000 and contains a diphenyl ether 4,4'-dicarboxylic acid component and a bivalent phenol component. [Chemical Formula 1]A-B&#x2003;&#x2003;(1)In the general formula 1, A represents a diphenyl ether 4,4&#x2032;-dicarboxylic acid residue represented by the formula A below, and B represents a bivalent phenol residue represented by the formula B below. In the formula A, each of Raand Raindependently represents a hydrogen atom or a monovalent substituent which may have a substituent, and each of n and m is independently an integer from 0 to 4. In the formula B, each of Rand Rindependently represents one selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, a halogen group, and an alkoxy group.

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Yokohama, Japan

Hiroyuki Tajima