Nikon Corporation

Nikon Corporation by Hiroyuki Sugimura

Hiroyuki Sugimura

Shinichi Tsukada

Akira Adachi

Asaji Masuko

Toshiro Umeda

Noboru Yoneya

Tatsuya Uchida

The present invention provides a method for producing an oxide film wherein a sharp-pointed processing electrode is positioned close to the material to be processed in an oxygen-containing gas, and a voltage in the single digit range is impressed across the material and the electrode so that the surface of the material is positive and the electrode is negative thereby causing an electric current to flow across the material and the electrode. The surface of the material reacts electrochemically with oxygen adsorbed on the surface of the material to anodize the surface immediately proximate the electrode. The method makes possible the formation of a patterned oxide film with a resolution of 0.1 .mu.m or less, thus surpassing the limit of conventional oxide film production methods. Processing efficiency and freedom of processing are significantly improved because an arbitrary oxide film pattern can be formed directly on the surface of a material thereby eliminating the use of a large number of complicated production processes.

Method for producing an oxide film

A focusing screen of the type composed of a multitude of micro-lens-like curved surfaces arranged on a given plane is substantially regular in terms of their two-dimensional arrangement on the above-mentioned plane but exhibits some variation in terms of the height of the microscopic surface roughness formed by the micro-lens-like curved surfaces. The variation range is determined in correspondence with the pitch of the above-mentioned two-dimensional arrangement. Also disclosed is a method of manufacturing a focusing screen exhibiting an appropriate degree of randomness in terms of its surface configuration.

Focusing screen and method of manufacturing same

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Yokohama, Japan

Hiroyuki Sugimura