Nissan Chemical Industries Limited

Hiroyuki Soda

Takahiro Sakaguchi

Takahiro Kishioka

Shojiro Yukawa

Isao Adachi

There is provided a photosensitive resin composition. A photosensitive resin composition including a component (A), a component (B); and a solvent, wherein the component (A) is a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2): (where R0 is a hydroxy group or a carboxy group; R1 is a hydrogen atom or a methyl group; R2 is a single bond or a C1-5 alkylene group; R3 is a thermally cross-linkable monovalent organic group; and in a plurality of structural units of Formula (2), R1 are optionally different from each other), and the component (B) is a photosensitizer.

Photosensitive resin composition

There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1): where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n1 of the unit structure of Formula (1) constituting the polymer (A) satisfies 0.3&#x2266;n1&#x2266;1.0.

Positive resist composition and method for production of microlens

There is provided a resin composition. A resin composition includes: a copolymer having structural units of the following Formula (1), Formula (2) and Formula (3): where X is a Calkyl group, a Ccycloalkyl group, a phenyl group or a benzyl group, while the alkyl group, the cycloalkyl group, the phenyl group and the benzyl group optionally have a portion or all of the hydrogen atoms substituted with halogen atoms, carboxy groups, hydroxy groups, amino groups or nitro groups; each of Rs is independently a hydrogen atom or a methyl group; Ris a single bond or a Calkylene group; Ris a blocked isocyanate group; Y is an &#x2014;O&#x2014; group or an &#x2014;NH&#x2014; group; Ris a single bond or a Calkylene group; and Ris a Chydrocarbon group or a phenyl group having a hydroxy group as a substituent; and a solvent.

Resin composition

There is provided a photosensitive resin composition for microlenses. A photosensitive resin composition for microlenses including a component (A), a component (B) and a solvent. The component (A): a copolymer having a maleimide structural unit of Formula (1) and a repeating structural unit of Formula (2). The component (B): a photosensitizer (in Formula (2), Ris a hydrogen atom or a methyl group; Ris a single bond or a Calkylene group; Ris a thermally cross-linkable monovalent organic group; and in the repeating structural unit of Formula (2), Rs are optionally different from each other).

Photosensitive resin composition for microlenses

A material for a planarization film, a spacer, and a microlens that satisfies heat resistance and transparency requirements without impairing a refractive index. A negative photosensitive composition includes a photopolymerizable polymer (A) having a fluorene skeleton, a monomer (B) having a fluorene skeleton and a photopolymerization initiator (C). The photopolymerizable polymer (A) having a fluorene skeleton may include a moiety that is soluble in an alkaline developer solution, or a unit structure of Formula (1): herein each Ris independently a Calkyl group or a halogen atom; each L is an integer of 0 to 4; X is an organic group having an unsaturated bond at a terminal thereof; and Y is a linking group including a portion that is obtained by removing an acid radical from a tetracarboxylic dianhydride.

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Funabashi, Japan

Hiroyuki Soda