Tokyo Ohka Kogyo Co., Ltd.

Hiroyuki Ohnishi

Yasuaki Sugimoto

Yusuke Nakagawa

Kousuke Doi

Masaru Shida

Isamu Takagi

Kazuhiko Nakayama

Isao Tateno

A positive photosensitive resin composition with favorable heat resistance and transparency is provided. The photosensitive resin composition contains a resin component (A1) having a structural unit (a1') obtained by substituting at least a portion of hydrogen atoms of phenolic hydroxyl groups within a structural unit represented by a general formula (a1) shown below with a naphthoquinone-1,2-diazide-5-(and/or -4-) sulfonyl group. (In the above general formula, Rrepresents a hydrogen atom or methyl group, Rrepresents a single bond or an alkylene group of 1 to 5 carbon atoms, Rrepresents an alkyl group of 1 to 5 carbon atoms, a represents an integer from 1 to 5, b represents either 0 or an integer from 1 to 4, and a+b is no greater than 5. If two or more Rgroups exist, then these Rgroups may be either the same or mutually different.)

Photosensitive resin composition and color filter

A positive photosensitive resin composition exhibiting excellent heat resistance is provided, which comprises an alkali-soluble resin component (A) and a photosensitizer (B), the component (A) including a resin component (A1) having a structural unit (a1) represented by general formula (a1) shown below: wherein Rrepresents a hydrogen atom or a methyl group; Rrepresents a single bond or an alkylene group of 1 to 5 carbon atoms; Rrepresents an alkyl group of 1 to 5 carbon atoms; and a represents an integer of 1 to 5, and b represents 0 or an integer of 1 to 4, with the proviso that the sum of a and b is 5 or less, and when two or more Rare present, Rmay be the same or different.

A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent,

Method for removing resist pattern

There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a novolak resin solution produced by dissolving a novolak resin in an organic solvent; a positive photoresist composition comprising the novolak resin solution and a photosensitive component; a positive photoresist composition comprising the novolak resin solution, a photosensitive component, and hydroquinone; and a method of producing a positive photoresist composition involving mixing the novolak resin solution described above and a photosensitive component.

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Kawasaki, Japan

Hiroyuki Ohnishi