Kabushiki Kaisha Toshiba

Ushio Denki Kabushiki Kaisha

Kyushu University

Mercian Corporation

Hiroyuki Ohashi

Shinji Suzuki

Hironori Kobayashi

Naoto Miyashita

Tatsushi Igarashi

Mariko Shimomura

Kinichi Morita

Hideaki Yagyu

Yuji Oki

Yoshiro Seki

Keisuke Naito

Toshihiro Koyama

Ichiro Katakabe

Tetsuya Tsukihara

Kazuchika Nagao

Tuyoshi Kato

Hideki Takase

Takashi Okoshi

Ryoji Takata

Tomonori Kon-No

Fumiko Tanzawa

An inactivation device inactivates microorganisms and/or viruses present in a space where a person is present by irradiating the space with ultraviolet light. The inactivation device includes a mobile body movable in the space, a drive section that drives the mobile body, an ultraviolet light irradiation unit provided with an ultraviolet light source emitting light including ultraviolet light having a wavelength that inactivates microorganisms and/or viruses, and a controller that controls the irradiation of the light from the ultraviolet light source. The ultraviolet light source is either an excimer lamp or an LED, and the ultraviolet light included in the light emitted from the ultraviolet light source includes ultraviolet light having a wavelength range from 200 nm to 240 nm. The ultraviolet light irradiation unit is fixed to the mobile body.

Inactivation device

A microplate reader includes multiple light projecting/receiving units, the number of the light projecting/receiving units being equal to or greater than the number of wells of the microplate, each light projecting/receiving unit including a light projecting unit and a light receiving unit that correspond to one of the wells of the microplate; a reflection member configured to reflect light having passed through samples stored in the wells from the light projecting/receiving units to the light projecting/receiving units; and a light guide part including projecting-light guide paths each configured to guide the light emitted from the light projecting unit to the sample, receiving-light guide paths each configured to guide the light reflected by the reflection member and having passed through the sample to the light receiving unit, and a surrounding member including a pigment-containing resin surrounding the projecting-light guide paths and the receiving-light guide paths.

Microplate reader

A control apparatus for a ventilator that ventilates a tunnel in response to visibility of the inside of the tunnel, including at least one picture image input device configured to take a picture of the inside of the tunnel, a visibility index determination device configured to determine a visibility index value on the basis of a picture image data of the picture taken by the picture image input device in light of a table representing a relationship between the picture image data and the visibility index value, a feedback controller configured to calculate an operation command for operating the ventilator on the basis of a feedback control value calculated by comparing the visibility index value with a target value of the visibility index value.

Control apparatus for ventilating a tunnel

A system and method are disclosed for controlling ventilation in a tunnel. According to the disclosed system and method, a set speed value for each vehicle traveling in the tunnel is determined based on the measured level of a physical phenomenon in the tunnel. The set speed value is communicated to each vehicle traveling in the tunnel and/or utilized to control a tunnel ventilator.

System and method for controlling ventilation in a tunnel

To provide an elevator speed controller capable of suppressing vibration of an elevator of which natural frequency is largely variable and enabling a highly accurate speed control irrespective of change in elevator characteristic and easy adjustment. An elevator speed controller, comprising a car speed command value setting means to set a car speed command value upon receipt of an elevator starting command to move a car up/down via a rope wound around a sheave by driving the sheave by a motor and a car speed command value correcting means to correct a car speed command value set by the car speed command value setting means by a vibration detected value detected by a car vibration detecting means so as to suppress the car vibration, in structure to control a motor speed according to a corrected car speed command value.

Elevator speed controller

The present invention provides the chemical-mechanical polishing method having the step of subjecting a film to be polished, provided on a main surface of a substrate, and having a projection portion and a recess portion on a surface thereof, to polishing and etching, wherein the projection portion of the film to be polished is mechanically polished and chemically etched while covering the recess portion with a protective film to protect it from being chemically etched by supplying a protecting agent on the film to be polished.

Chemical mechanical polishing method, polisher used in chemical

This invention provides a CMP (Chemical-Mechanical Polishing) method for controlling the polishing rate using ionized water and a CMP apparatus which employs the CMP method. A polishing pad is attached to a polishing disc. A semiconductor wafer is held by a wafer carrier placed above the polishing disc, and is pressed by the wafer carrier against the polishing pad which rotates together with the polishing disc. As a result, the semiconductor wafer is polished. The polishing is performed while a polishing slurry containing polishing particles is supplied to the polishing pad from a polishing slurry tank through a polishing-slurry supply pipe, and ionized water is supplied thereto through an ionized-water supply pipe. In the case of using alkaline ionized water as the ionized water, the polishing rate can be increased in a stable manner by increasing the pH value of alkaline ionized water, and can be reduced in a stable manner by reducing the pH value of alkaline ionized water. On the other hand, in the case of using acidic ionized water as the ionized water, the polishing rate can be increased in a stable manner by reducing the pH value of acidic ionized water, and can be reduced in a stable manner by increasing the pH value of acidic ionized water.

Chemical-mechanical polishing (CMP) method for controlling polishing

A plurality of cells are provided in a concave portion of a top plate. A cloth to which water is penetrated is provided in a back face of each cell, and a wafer is attracted by the cloth. First and second pipes are connected to each cell. The first pipe introduces liquid to the cell, and the second pipe discharges liquid from the cell, and guides liquid to the first pipe. A constant-temperature device is provided to each first pipe, and a temperature of liquid of each cell is adjusted by the constant-temperature device in accordance with a temperature distribution of the wafer. Whereby, a polishing rate of each part of the wafer can be equalized.

Polishing apparatus of semiconductor wafer

Growing community of inventors

Tokyo, Japan

Hiroyuki Ohashi