Fujifilm Corporation

Fujifilm Manufacturing Europe B.v.

Hiroyuki Noda

Yujiro Itami

Takeshi Umehara

Kimiko Iwahashi

Masatoshi Nakanishi

Akihiro Kurima

Makoto Sawada

Takeshi Narita

Yusuke Mochizuki

Atsushi Mukai

Shigehide Itou

Shigehide Itoh

Petrus Van Kessel

Daisuke Sawai

Tadashi Kajiya

Koji Miyata

Provided are a physical property measurement method, a physical property measurement device, and a probe that can simply measure physical properties of a surface layer portion of an object. A physical property measurement method includes a step of bringing a probe into contact with a surface layer portion of a liquid or gel-like object and maintaining a contact state, a step of measuring a height of the object rising along the probe in contact with the object, and a step of calculating viscous properties or elastic properties of the surface layer portion of the object using the measured height of the object rising along the probe.

Physical property measurement method, physical property measurement device, and probe

Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator.0.9&#x2265;&#x2265;0.63&#x2003;&#x2003;Expression 1&#x2265;1.7&#x2003;&#x2003;Expression 2In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.

Gas separation membrane, method of producing gas separation membrane, gas separation membrane module, and gas separator

Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator.0.9&#x2265;&#x2265;0.55&#x2003;&#x2003;Expression 1&#x2265;1.7&#x2003;&#x2003;Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.

Gas separation membranes with intermixed layers

A composite membrane comprising: a) a porous support; b) a gutter layer; and c) a discriminating layer; wherein at least 10% of the discriminating layer is intermixed with the gutter layer.

A composite membrane comprising: a) a porous support; b) a gutter layer, a portion of which is present within the support and a portion of which is outside of the support; and c) a discriminating layer on the gutter layer; wherein: (i) the portion of the gutter layer outside of the support has an average thickness (GL) of 10 nm to 900 nm; and (ii) the portion of the gutter layer present within the support has an average thickness (GL) of 10% to 350% of GL.

Curable compositions and membranes

Growing community of inventors

Kanagawa, Japan

Hiroyuki Noda