Ebara Corporation

Seikosha Co., Ltd.

Director-general of Agency of Industrial Science and Technology

Japan As Represented by Director General of Agency of Industrial Science

Hiroyuki Niino

Akira Yabe

Masashi Shimoyama

Hirokazu Ono

Nobuhiro Kondo

Tomoaki Takahashi

Toshio Matsumura

Yoshinaga Takahashi

A method of processing a photosensitive glass includes exposing. Photosensitive glass by radiation from a laser whose oscillation wavelength lies within the range of wavelengths of exposing light to which the glass responds. Then, the exposed portions 1c are thermally developed and etched. Since a laser beam propagates with a high rectilinearity, the front and rear surfaces of thick photosensitive glass can be exposed without producing dimensional errors. Therefore, the etching accuracy is improved. Especially, where the front and rear surfaces of photosensitive glass are etched, both surfaces can be processed so as to form the same shape in them accurately. In addition, because almost all the energy of the laser radiation is used for exposure of the photosensitive glass, the energy is not wasted and so the efficiency is high.

Method of processing photosensitive glass

Method of forming a thin electroconductive film

Growing community of inventors

Ibaraki, Japan

Hiroyuki Niino