Sharp Display Technology Corporation

Hiroyuki Moriwaki

Makoto Nakazawa

Rikiya Takita

Tetsuya Tanishima

Fumiki Nakano

A photoelectric conversion panel includes a TFT, a photodiode disposed at an upper layer than the TFT, a first organic film formed at an upper layer than the photodiode, a first inorganic insulating film covering at least a part of the first organic film, and a second organic film covering at least a part of the first inorganic insulating film. The first inorganic insulating film includes a first hole portion connecting the first organic film and the second organic film, and a first moisture-proof portion at least a part of which is disposed at a side of the photodiode with respect to the first hole portion. The first moisture-proof portion penetrates the first organic film.

Photoelectric conversion panel, X-ray imaging panel, and manufacturing method of photoelectric conversion panel

A photoelectric conversion panel includes a TFT, a photodiode, a first organic film formed on an upper layer from the photodiode, a bias line formed on an upper layer from the first organic film, a data line separated from the bias line, a second organic film covering the first organic film, the bias line, and the data line, and a first inorganic insulating film. Part of the second organic film is disposed between the bias line and the data line. The first inorganic insulating film covers the second organic film.

A photoelectric conversion panel includes multiple thin-film transistors (TFTs) formed on an substrate, photodiodes respectively connected to the TFTs, and a metal layer formed on a light incident side of the photodiodes. The metal layer is formed in a position to overlap a subset of the photodiodes in a plan view.

Photoelectric conversion panel, x-ray panel, and imaging apparatus

In a manufacturing method of a photoelectric conversion panel, a contact hole CHthat exposes a part of an upper face of a photodiode and a contact hole CHthat exposes a source connection electrode are formed in a first flattening film and in inorganic insulating filmsto, an inorganic insulating filmis formed, contact holes CHand CHare formed in the contact holes CHand CH, respectively, and a bias line and a data line are formed in the contact holes CHand CH, respectively.

Manufacturing method of photoelectric conversion panel, photoelectric conversion panel, and X-ray panel

A photoelectric conversion panel includes: a thin film transistor; a first organic film formed in an upper layer with respect to the thin film transistor; a photoelectric conversion element formed in an upper layer with respect to the first organic film; and a first inorganic insulating film formed so as to cover at least a part of the first organic film, wherein the first inorganic insulating film has a through hole that exposes a part of the first organic film.

Growing community of inventors

Kameyama, Japan

Hiroyuki Moriwaki