Tdk Corporation

Hiroyuki Miyamoto

Makoto Yoshida

Taro Oike

Shin Narushima

Tetsuo Miyazaki

Junichi Sato

Akio Iijima

Kazuya Maekawa

Kenji Takeo

A writing magnetic pole portion composed of a first magnetic film and a second magnetic film formed on the first magnetic film via a gap film is fabricated on a given wafer. Then, the writing magnetic pole portion is swung forward and backward around a rotation standard axis parallel to a center line of the writing magnetic pole portion in a direction parallel to a surface of the. Then, the writing magnetic pole portion is milled during the swing of the writing magnetic pole portion to define the width of the writing magnetic pole portion.

Method for fabricating a thin film magnetic head

A plating underlayer is formed on an insulating film. An anti-reflection film is formed on the plating underlayer. A photoresist is formed over the antireflection filmThe photoresist and the antireflection film are exposed and developed to form a resistframe made thereof. A second magnetic layer is formed within an inner pattern enclosed by the resistframe. The anti-reflection film is made of a material soluble for a developer through exposure.

An electrode film and a protective electrode film are formed on an insulating film and a first magnetic film in turn. Then, a first photoresist layer, an intermediate layer and a second photoresist layer are formed on the protective electrode film in turn. The intermediate layer is formed by a sputtering method so that the surface temperature of the intermediate layer is set to 140&#xb0; C. or below. Then, the first photoresist layer is exposed and developed, to fabricate a photoresist pattern. Then, the intermediate layer is partially etched and removed via the photoresist pattern as a mask by a reactive ion etching method using a chlorine-based gas.

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Chuo-ku, Japan

Hiroyuki Miyamoto