Jsr Corporation

Nissan Motor Company Limited

Google Inc.

Sumco Corporation

Keiyo Engineering Co., Ltd.

Dental Aid Co. Ltd.

Hiroyuki Komatsu

Takehiko Naruoka

Tomoki Nagai

Akira Sawada

Hitoshi Osaki

Takashi Nakajima

Yuji Katsumata

Ken Ito

Masafumi Hori

Shinya Minegishi

Tomohiro Oda

Miki Tamada

Motohiro Shiratani

Kaori Sakai

Ken Itou

Yasuhiro Matsuda

Tatsuya Sakai

Jun Motosugi

Yui Ito

Takuya Oikawa

Daigo Hamura

Jun Mukai

Taku Kudo

Toshiyuki Hanaoka

Yohei Yukawa

Yusuke Tabata

Junichi Matsuo

Hiroyuki Matsuyama

Shou Oono

Ryo Kumegawa

Shigeru Ono

Yuuji Katsumata

Kuniyuki Komatsu

Yoichi Hirakawa

Chieko Takada

A pattern-forming method includes applying a first composition on a surface layer of a substrate to form a first coating film. The surface layer includes a first region which includes a metal atom, and a second region which includes a silicon atom. The first coating film is heated. A portion other than a portion formed on the first region or a portion other than a portion formed on the second region of the first coating film heated is removed, thereby forming a first lamination portion. A second composition is applied on the substrate on which the first lamination portion is formed to form a second coating film. The second coating film is heated or exposed. A portion other than a portion formed on the first lamination portion of the second coating film heated or exposed is removed, thereby forming a second lamination portion.

Pattern-forming method and composition

An electric vehicle control method for controlling a motor based on a torque command value in an electric vehicle includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; and a vehicle state control including a stop process of calculating a stopping basis torque target value so as to converge the torque command value to the disturbance torque estimation value in accordance with a decrease in the speed parameter, and a vibration damping process of calculating a stopping correction torque target value by performing filtering on the stopping basis torque target value.

Electric vehicle control method and electric vehicle control device

A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.

Composition, method of producing substrate, and polymer

A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.

Method and composition for selectively modifying base material surface

Provided is an electric vehicle control method. The electric vehicle control method includes: a disturbance torque estimation process of calculating a disturbance torque estimation value including an influence of a road surface gradient; a speed parameter acquisition process of acquiring a speed parameter relating to a vehicle speed; a stop process of calculating a stopping basis torque target value so as to converge a torque command value to the disturbance torque estimation value in accordance with a decrease of a speed parameter; and a vibration damping process of calculating a stopping correction torque target value by performing filterring on the stopping basis torque target value. In the vibration damping process, the torque command value is set based on the stopping basis torque target value in a first just-before-stop period set in a relatively high vehicle speed range, and is set based on the stopping correction torque target value in a second just-before-stop period set in a relatively low vehicle speed range.

A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.

Composition for underlayer film formation, underlayer film for directed self-assembled film and forming method thereof, and directed self-assembly lithography process

A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). Aand Aeach independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. Lrepresents &#x2014;S&#x2014;, &#x2014;NR&#x2014;, or &#x2014;NA-, wherein Arepresents a monovalent group having a functional group capable of forming a chemical bond with a metal atom. 

Composition, polymer, and method of producing substrate

A modification method of a surface of a substrate includes: applying a composition on a surface of a metal substrate, and heating a coating film formed by the applying, wherein the composition contains: a polymer having a first structural unit that includes an aromatic ring, and a second structural unit that includes an ethylenic double bond; a thermal acid generating agent; and a solvent, wherein the polymer has a functional group capable of bonding to a metal atom in the metal substrate.

Modification method of substrate surface, and composition and polymer

A composition for film formation includes a polymer and a solvent. The polymer includes a first repeating unit, a second repeating unit, a third repeating unit, and a structural unit on at least one end of a main chain of the polymer. The first repeating unit includes a crosslinkable group. The second repeating unit differs from the first repeating unit. The third repeating unit differs from the first repeating unit and has higher polarity than polarity of the second repeating unit. The structural unit includes an interacting group capable of interacting with Si&#x2014;OH, Si&#x2014;H or Si&#x2014;N.

Composition for film formation, film-forming method and directed self-assembly lithography process

A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.

Pattern-forming method and patterned substrate

A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of Rs are identical or different. 

Modification method of surface of base, composition, and polymer

A composition for pattern formation includes a first polymer, a second polymer and a solvent. The first polymer includes: a first block including a first structural unit derived from a substituted or unsubstituted styrene; and a second block including a second structural unit other than the first structural unit. The second polymer includes: the first structural unit; and a group bonding to at least one end of a main chain thereof and including a polar group. The polar group is preferably a hydroxy group or a carboxyl group. A number average molecular weight of the second polymer is preferably no greater than 6,000. A mass ratio of the second polymer to the first polymer is preferably no less than 0.15 and no greater than 0.4. The solvent preferably comprises a compound comprising a hydroxyl group and an alkyl ester group.

Composition for pattern formation, and pattern-forming method

A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle &#x3b8; (&#xb0;) of water on the sidewall of the pattern satisfies inequality (1). 

Pattern-forming method, and composition

A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including silicon. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the silicon. The first region preferably contains a silicon oxide, a silicon nitride, or a silicon oxynitride. The base material preferably further includes a second region that is other than the first region and that contains a metal; and the method preferably further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film.

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Tokyo, Japan

Hiroyuki Komatsu