Matsushita Electric Industrial Co., Ltd.

Panasonic Corporation

Ngk Insulators, Inc.

Hiroyasu Tsuji

Keisuke Sumida

Masanori Suzuki

Makoto Morita

Daisuke Adachi

Satoru Mitani

Masaya Sakaguchi

Tsuguhiro Korenaga

Shinji Uchida

Toshio Fukazawa

Tadashi Kimura

Hiroyoshi Sekiguchi

Hiroshi Sakakima

Masayoshi Hiramoto

Norimoto Nouchi

Toshihiro Kuriyama

Yuji Matsuda

Isao Muragishi

Shogo Nasu

Akira Ahagon

Michiro Aoki

Hirosuke Mikami

Shougo Nasu

Hihuo Noiri

Takahiro Takeda

Yasuhiro Iwano

Masato Naganawa

Norimoto Nochi

The present invention provides an image display device capable of displaying a good image by suppressing yellowing of a glass substrate, and a high-yield manufacturing method of the glass substrate. The image display device is formed of a front-side glass substrate and a back-side glass substrate. In this manufacturing method, a glass substrate is used as the front-side glass substrate when Sn++ content in the glass substrate is a predetermined value or less, and the glass substrate is used as the back-side glass substrate when the Sn++ content exceeds the predetermined value.

Image display device and manufacturing method of the same

Provided are an image display device capable of displaying a good image by suppressing yellowing of a glass substrate, and an evaluating method of the glass substrate. The image display device is formed using the glass substrate where reflectance at wavelength of 220 nm is 5% or lower. In the evaluating method of the glass substrate for the image display device, Sncontent in the glass substrate is analyzed using reflectance at wavelength of 220 nm.

Image display and method for evaluating glass substrate to be used in same

The present invention provides an image display device capable of displaying a good image by suppressing yellowing of a glass substrate, and a high-yield manufacturing method of the glass substrate. The image display device is formed of a front-side glass substrate and a back-side glass substrate. In this manufacturing method, a glass substrate is used as the front-side glass substrate when Sncontent in the glass substrate is a predetermined value or less, and the glass substrate is used as the back-side glass substrate when the Sncontent exceeds the predetermined value.

Image display device and method for manufacturing same

The present invention provides a manufacturing method of a glass substrate for an image display device having high picture quality. The reducing force in a float furnace is controlled to be decreased so that Sn++ content on a surface of the glass substrate forming an Ag electrode is a predetermined value or less. When the resultant Sncontent on the surface of the glass substrate forming the Ag electrode exceeds the predetermined value, the surface is partially removed to decrease the Sncontent to the predetermined value or less to suppress the occurrence of yellowing of the glass substrate.

Method for manufacturing glass substrate for image display

A transition section for relieving the temperature difference between a front and a back of a substrate is provided before a temperature section at which constituent elements are fired. As a result, a method of manufacturing a plasma display panel and a firing apparatus, where the temperature difference between the front and the back of the substrate in a substrate-moving direction is prevented and the constituent elements are fired well, can be provided.

Method of manufacturing plasma display panel and firing apparatus

A method of manufacturing plasma display panels includes using a firing device that allows preferable firing of panel components by cleaning each setter. A cleaning section provided in a lower passage of the firing device allows removal and cleaning of abrasion powder generated while setter is transported by rotation of rollers. This reduces attachment or mixing of abrasion powder to a panel component.

Method of manufacturing plasma display panels and baking panel device used for the method

Disclosed is a method of manufacturing PDPs, and a firing device that allows preferable firing of panel components by controlling each setter. Transportation structure configured by disposing rollers in a transport direction of a substrate allows firing of a panel component while transporting the substrate placed on a setter. An ID identification device for identifying a setter using an ID area provided on the setter is provided on a firing device. Panel components are fired using this firing device for controlling information such as a number of heatings of each setter.

Plasma display panels manufacturing method and sintering device

A baking system for a plasma display panel which comprises a clean roomand a baking furnace having an upper passagefor conveying a plasma display panel glass substrateduring baking from an inletof the furnace, and a lower passagefor conveying the baked substratein the upper passagetowards an outlet of the furnace, both of the inlet and the outlet being provided at the same end of the furnace, characterized in that only the inletand the outletare connected to a clean room, while keeping a body thereof outside the clean room. Also, there is disclosed a layout method for such a baking system.

Baking system for plasma display panel and layout method for said system

A thin film magnetic head which includes a magnetoresistive layer selectively formed; a magnetic bias layer sandwiching said magnetoresistive layer; a pair of leads for detecting magnetic resistance; and a cap layer formed under the lead between the magnetoresistive layer. This configuration enables to accurately specify a magnetic response region by both ends of the cap layers, concentrating the current from the lead onto the magnetic response region through a tip of the cap layer for improving a S/N ratio.

Thin film magnetic head

As an electrically conductive layer or a lower layer of conductor layers to be patterned, a conductor layer which is dry-etchable with an oxygen-containing gas is provided. A dry etching process of the conductor layer with the oxygen-containing gas is performed highly selectively to a ground film.

Thin film device and method for manufacturing thin film device

A thin film magnetic head that provides, despite a narrow head track width, strong recording magnetic fields and demonstrates a sufficiently high recording capability for the high Hc recording media. The lower magnetic pole is formed with a lower write chip section and a shared shield section, while the upper magnetic pole is formed with an upper write chip section and a yoke section. The lower and upper write chip sections are made of a high Bs magnetic material, the yoke section is made of a high &rgr; magnetic material, and the shared shield section is made of permalloy or the like magnetic material. The upper write chip section is longer than the lower write chip section (which corresponds to the head gap depth); this configuration makes the contact area with the yoke section greater, even if the head track width is narrow, and provides strong recording magnetic fields.

Thin film magnetic head and method for fabricating same

The present invention provides a magnetic film expressed by a composition formula T M X N O (T is a magnetic metal such as Fe, M is an alkaline earth metal such as Be, Mg, and Ca, and X is at least one selected from the group consisting of Y, Ti, Zr, Hf, V, Nb, Ta and lanthanoid), where a&plus;b&plus;c&plus;d&plus;e&equals;100, 45 &lE;a&lE;85, 5.5&lE;b&lE;28, 0.5&lE;c&lE;16, 6&lE;b&plus;c&lE;28.5, 0.4 <b/c &lE;56, 0&lE;d&lE;10, and 8&lE;d&plus;e&lE;40. The magnetic film comprises mainly metal magnetic crystal grains having an average crystal grain diameter of not more than 15 nm and a grain boundary product. The grain boundary product substantially separates the metal magnetic crystal grains. The main component of the metal magnetic crystal grains is the T. The grain boundary product contains at least an oxide or a nitride of the M and the X. The magnetic film has a saturation magnetic flux density of not less than 0.8 T and an electric resistivity of not less than 80 &mgr;&OHgr;cm.

High resistance magnetic film

This invention provides a light absorber which can be used for optical equipment like optical-disk equipment and a liquid crystal display. The light absorber has a layered structure including a light absorbing layer and a transparent layer. The light absorbing layer absorbs a reflected light from the inside of the absorber as well as incident light into the absorber while the transparent layer helps attenuate the reflected light by interference of light. One of the light absorbing layers which is thicker than others may work as a shading layer for the incident light.

Light absorber and optical equipment

A prism and an optical pickup employing such prism includes a parallel prism having a polarization beam splitter film and a reflection film. The polarization beam splitter film is formed on an angled plane of a glass material having an approximate parallelogram cross-section, and consists of a multi-layer film of a composite film made of Si and SiO.sub.2-x (x&lt;0.5) and multiple layers of multiple dielectric films. The reflection film is formed on an angled plane of the same glass material approximately parallel to the angled plane on which the polarization beam splitter film is formed, and consists of a multi-layer film of a composite film made of metal Si and oxide SiO.sub.2-x (x&lt;0.5) as a high refractive film and multiple layers of multiple dielectric films as a relatively low refractive film.

Composite prism and optical pickup using the same

A non-magnetic single crystal of Mn--Zn ferrite obtained by a solid phase reaction process including the steps of contacting a seed single crystal ferrite with a polycrystal crystal ferrite and producing the single crystal by growing the single crystal in a direction from the seed single crystal toward the polycrystal under heating. The single crystal of Mn--Zn ferrite has a composition defined by points A, B, C, D and E in a three-phase diagram of Fe.sub.2 O.sub.3 --MnO--ZnO, in which:

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Sennan-gun, Japan

Hiroyasu Tsuji