Mitsubishi Denki Kabushiki Kaisha

Hiroyasu Itoh

Kazunori Inoue

Nobuaki Ishiga

Masashi Yonemoto

Toshio Araki

Eiji Shibata

Fumihiro Gotoh

Masanao Nabeshima

A method for manufacturing thin film transistor array substrate for a liquid crystal display device-includes:&#x2014;(a) forming a first metal thin film layer on a insulating substrate and forming a gate wiring and a gate electrode by a first photolithography. (b) forming a gate insulating film layer, a semiconductor film layer, an ohmic contact film layer and a second metal thin film layer, and forming the thin film transistor by a second photolithography, (c) forming an interlayer insulating film, and forming a pixel contact hole, a first contact hole and a second contact hole by a third photolithography, and (d) forming a transparent conductive film, and forming a pixel electrode by a fourth photolithography. The first metal thin film has a two-layered structure comprising a first layer made of aluminum or aluminum alloy and a second layer located on said first layer, and the second metal thin film is formed of an alloy mainly containing molybdenum.

Method for manufacturing a thin film transistor array substrate for a liquid crystal display device

An elevator safety device in which a counterweight cam is attached to the counterweight and top terminal landing final limit switches are disposed below the bottom terminal landing of the hoistway so that it is operated by the counterweight cam. The top terminal landing final limit switches only need to be provided in accordance with the counterweight buffer stroke, regardless of to what extent the car has been flung upward, with the result that fewer final limit switches are required.

Elevator safety device

Growing community of inventors

Kumamoto, Japan

Hiroyasu Itoh