Mitsubishi Gas Chemical Company, Inc.

Cellseed, Inc.

Sony Corporation

Dai Nippon Printing Co., Ltd.

Tokyo Woman's Medical University

Hiroya Watanabe

Teruo Okano

Tatsuya Shimizu

Masayuki Yamato

Masanao Watanabe

Masaru Ohto

Koichiro Saga

Yoshikatsu Akiyama

Yuriko Kitano

Tadashi Shimomura

Tomoyuki Azuma

Manabu Mizutani

Kenichi Hagiwara

Keisuke Ashiba

A substrate having a pattern of two or more materials exhibiting different grafting efficiencies for a temperature-responsive polymer that varies its interaction with water in a temperature range of 0 to 80&#xb0; C. by electron beam irradiation under the same conditions is grafted with the temperature-responsive polymer by simultaneously irradiating the surfaces of the materials with electron beams to obtain a temperature-responsive cell culture substrate. According to this method, a temperature-responsive cell culture substrate having a surface () that allows cells to adhere thereto and to grow thereon during cell culturing and that allows the adhering and grown cells to be detached therefrom by changing the culturing temperature and a surface () that does not allow the cells to adhere thereto at all can be obtained by a simple process.

Temperature-responsive cell culture substrate and method for producing the same

An object of the present invention is to provide a cell culture support making the detachment of a cell sheet easy as well as enabling the formation of a uniform cell sheet. The present invention relates to a method for manufacturing a cell culture support having a temperature responsive polymer immobilized onto the surface thereof via covalent bonding, the method including a coating step in which a composition including a monomer that can form the polymer by polymerization by radiation irradiation, an organic solvent and, in some cases, a prepolymer formed by polymerization of the monomer is coated onto the substrate having a surface containing a material which can be covalently bonded to the temperature responsive polymer by radiation irradiation to form a film on the surface of the substrate, a radiation irradiation step in which a polymerization reaction and a binding reaction between the substrate surface and the temperature responsive polymer are allowed to proceed by irradiating radiation to the film, and a drying step to dry the film.

Cell culture support and manufacture thereof

A structural body comprising a substrate and a structural layer formed on the substrate through an air gap in which the structural layer functions as a micro movable element is produced by a process comprising a film-deposition step of successively forming a sacrificial layer made of a silicon oxide film and the structural layer on the substrate, an air gap-forming step of removing the sacrificial layer by etching with a treating fluid to form the air gap between the substrate and the structural layer, and a cleaning step. By using a supercritical carbon dioxide fluid containing a fluorine compound, a water-soluble organic solvent and water as the treating fluid, the sacrificial layer is removed in a short period of time with a small amount of the treating fluid without any damage to the structural body.

Process for producing structural body and etchant for silicon oxide film

Emission of NOx during acid-piclding treatment of metals in an aqueous solution containing at least nitric acid is controlled by the addition of hydrogen peroxide. The addition amount of hydrogen peroxide is minimized to avoid excessive addition by monitoring the potentiostatic electrolytic current of the solution or by combinedly monitoring the potentiostatic electrolytic current and the redox potential of the solution.

Method of controlling NOx gas emission by hydrogen peroxide

Growing community of inventors

Tokyo, Japan

Hiroya Watanabe