Sekisui Chemical Co., Ltd.

Hiroya Kitahata

Yuji Eguchi

Setsuo Nakajima

Tsuyoshi Uehara

Junichiro Anzai

Takuya Yara

Norifumi Fujimura

Ryoma Hayakawa

Shinichi Kawasaki

Sumio Nakatake

Yoshinori Nakano

In a plasma film forming apparatus, two first electrodesconnected to a power sourceand two grounded second electrodesare arranged in the order of the second electrode, the first electrode, the first electrodeand the second electrode. A first flow passageformed between the central first electrodesallows a raw material gas (first gas) for being formed into a film to pass therethrough. A plasma discharge spaceof a second flow passage formed between the first and second electrodeson the both sides allows an excitable gas (second gas) to pass therethrough, which excitable gas is exited by plasma such that the raw material can be formed into a film, but that the excitable gas itself is merely excited but not formed into a film. Those gases are converged at a crossing partbetween the first and second flow passages and blown off via a common blowoff passage. By this, the apparatus composing members such as electrodes can be prevented from being adhered with a film.

Plasma film forming system

Uniform oxynitride and nitride films can be formed by low-temperature and high-speed nitriding reaction not dependent on the nitriding time or nitriding temperature. A solid dielectric is provided on at least one of opposed surfaces of a pair of electrodes opposed to each other under a pressure of 300 (Torr) or higher, a nitrogen gas containing an oxide equal to or lower than 0.2% is introduced into a space between the pair of opposed electrodes, an electric field is applied to the nitrogen gas, and the resulting N(2p.s.) or N(H.I.R) active species is brought into contact with an object to be processed to form an oxynitride film/nitride film on a surface of the object to be processed.

Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrate

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Hachioji, Japan

Hiroya Kitahata