Nippon Sheet Glass Company, Limited

Toyota Jidosha Kabushiki Kaisha

Hirotsugu Nagayama

Hideo Kawahara

Akihiro Hishinuma

Takuji Goda

Hisao Honda

Yasuhiro Otsuka

Akio Takigawa

Yasuto Sakai

Hiroaki Tada

Juichi Ino

Naoto Hirayama

Kiyotaka Sasaki

Misao Tsutsuki

An inorganic or organic glass product, or tempered glass product excellent in weatherability, water resistance, moisture resistance and abrasion resistance, which is formed of a) a silicate glass substrate, b) a porous modified layer enriched with silicon oxide through removal of components other than silicon oxide in a surface layer of the silicate glass substrate, and c) a water-repellent layer formed of at least one compound of an organic silicon compound and an organic fluorine compound on a surface of the porous modified layer.

Water-repellant glass products and process for the production thereof

A process for depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by heating a hydrosilicofluoric acid solution substantially saturated with silicon dioxide which has a temperature of not more than 0.degree. C., to a temperature of not less than 25.degree. C.

Process for depositing silicon dioxide films

A method of depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by increasing the temperature of a hydrosilicofluoric acid solution substantially saturated with silicon dioxide.

Method of depositing a silicon dioxide film

A film of the oxide of a metal selected from the group consisting of Sn, Zr, In, V, Cr, Mn, Fe, Co, Ni, and Cu is deposited on the surface of a substrate by a method which comprises establishing contact between the substrate and a treating liquid containing fluorine and the metal selected as described above thereby having the oxide of the metal dissolved to supersaturation therein.

Method for production of oxide film

An electrochromic device comprising an oxidation coloring substance coloring in an oxidized state and a reduction coloring substance coloring in a reduced state which are formed on the surfaces of a pair of electrodes, respectively, and an electrolyte held between the two substances, wherein the oxidation coloring substance is a double salt containing an iron hexacyanoferrate and the reduction coloring substance is a tungsten-oxalic acid compound. The electrochromic device has a long life suitable for actual applications and a short response time and can operate at low applied voltages.

Electrochromic device

A method of depositing a silicon dioxide film by bringing a substrate into contact with a hydrosilicofluoric acid solution supersaturated with silicon dioxide by the addition of an additive to deposit silicon dioxide film on the surface of the substrate, wherein the additive is at least one compound selected from the group consisting of an aluminum compound, a calcium compound, a magnesium compound, a barium compound, a nickel compound, a cobalt compound, a zinc compound, and a copper compound, and/or a metal or metals.

A method for making a silicon dioxide coating on a surface of a substrate such as, for example, an alkali metal-containing glass sheet by dipping the substrate in a treatment liquid obtained by adding boric acid to an aqueous silicon dioxide-saturated solution of hydrosilicofluoric acid.

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Nishinomiya, Japan

Hirotsugu Nagayama