Matsushita Electronics Corporation

Matsushita Electric Industrial Co., Ltd.

Hirotsugu Hattori

Yoshimi Tanaka

Kazuo Fujimoto

Masahiro Kuwagata

Yuichiro Takayama

Eiiti Kosoegawa

In bonding a semiconductor substrate onto a mounting means, a multiple layer metal electrode is formed on the surface, the multiple layer comprising at least a chromium-nickel alloy layer, nickel layer and a noble metal layer of a noble metal selected from a group consisting of gold, silver or platinum, which is bonded to a solder layer of Pb-Sn-alloy or Ag-Sb-Sn-alloy of the mounting means.

Contact structure for a semiconductor substrate on a mounting body

A method of manufacturing semiconductor devices is provided which comprises the steps of depositing a coating of platinum on the surface of a silicon substrate prior to the formation of a plated nickel layer thereon, plating a layer of nickel on the silicon substrate coated with platinum, and then subjecting the structure to the process of heat treatment to thereby cause the platinum to diffuse into the silicon substrate, whereby the platinum acts to increase the adhesion strength of the plated nickel layer on the silicon substrate and further the platinum element diffused into the silicon substrate serves as a lifetime killer of carriers to thereby improve the switching characteristic of the semiconductor device.

Method of manufacturing semiconductor devices

A cathodic protection, anticorrosive circuit comprises a diode connection of a transistor or a Schotkky diode interconnected between a buried structure to be protected and a galvanic anode or the like so that even when the difference in potential between them is relatively low, an effective forward or anticorrosion current may flow while positively preventing the reverse current which causes the corrosion of the buried structure.

Growing community of inventors

Takatsuki, Japan

Hirotsugu Hattori