Tokyo Ohka Kogyo Co., Ltd.

Hiroto Yamazaki

Masatoshi Arai

Yoshitaka Komuro

Kenta Suzuki

Masahito Yahagi

Nobuhiro Michibayashi

Daisuke Kawana

Takuya Ikeda

Tatsuya Fujii

Mari Murata

Masahiro Shiosaki

Seiji Todoroki

A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid. The resist composition includes a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (d0) in which Rdrepresents a monovalent organic group, Rdrepresents a single bond or a divalent linking group, m represents an integer of 1 or greater, and Mrepresents an m-valent organic cation

Resist composition, method of forming resist pattern, and acid diffusion-controlling agent

A resist composition including a compound represented by formula (b1) in which Rrepresents an aryl group which may have a substituent; Rand Reach independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a halogen atom, and at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a sulfonyl group; and Xrepresents a counteranion 

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

A resist composition including a compound represented by formula (b1) in which Rrepresents an aryl group which may have a substituent; Rand Reach independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a halogen atom, and at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a sulfonyl group; and Xrepresents a counteranion. 

A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, the entire anion moiety may be an n-valent anion, and Mrepresents an m-valent organic cation 

Resist composition, and method of forming resist pattern

A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including a polymer compound (A1) which has a constitutional unit (a0) derived from a compound represented by Formula (a0-1) and a constitutional unit (a10) derived from a compound represented by Formula (a10-1) and does not have a constitutional unit represented by Formula (1). In the formulas, Raand Rarepresent a polymerizable group-containing group; Waand Warepresent an (n+1)-valent or (n+1)-valent aromatic hydrocarbon group; nand nrepresent an integer of 1 to 3; and Zrepresents Fe, Co, Ni, Cr, or Ru. 

Resist composition, method of forming resist pattern, and polymer compound

A resist composition including a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1), an onium salt having an anion moiety with a specific structure, and a photodecomposable base which is decomposed upon exposure and then loses the ability of controlling of acid diffusion. In formula (a0-1), Rarepresents a polymerizable group-containing group; Warepresents an aromatic hydrocarbon group having a valency of (n+1), provided that Raand Wamay together form a condensed ring structure; nrepresents an integer of 1 to 3; Yarepresents a carbonyl group or a single bond; Rarepresents a hydrogen atom or a hydrocarbon group which may have a substituent. 

Resist composition and method of forming resist pattern

A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0):  Zto Zeach independently represent a substituent having electron withdrawing properties, Rband Rbeach independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rbrepresents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0represents an organic anion.

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Hiroto Yamazaki