Kurita Water Industries Ltd.

Nikon Corporation

Hiroto Tokoshima

Hiroshi Morita

Hiroyuki Nagasaka

Hideki Kobayashi

Junichi Ida

Nobuko Gan

Yu Fujimura

Kazuya Ishiwata

Keita Seo

A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.

Dilute chemical solution producing apparatus and dilute chemical solution producing method

A solution having a predetermined concentration is stably supplied to a use point, at which the amount of use of the solution changes, by only modifying currently-used equipment at a low cost and in a space-saving manner. In order to supply a solution containing a solute at a predetermined concentration from a preparation portion of the solution to a use point through a supply pipe, a retention portion that has no gas-liquid interface and at which the solution is retained is provided at an intermediate portion of the supply pipe. Even when the amount of use of the solution at the use point changes, the change is absorbed by the retention portion, whereby a solution having a predetermined concentration can be stably supplied to the use point.

Supply method for liquid and supply apparatus

A device for supplying water containing dissolved gas includes a gas permeable film module that is partitioned into a gas phase chamber having a connection port at a bottom part and a liquid phase chamber by a gas permeable film, a feed unit feeding water to be treated to the liquid phase chamber, a gas supply unit supplying gas to the gas phase chamber, and a vacuum evacuation unit, connected with the gas phase chamber with the connection port, so that the gas is supplied to the gas phase chamber by the gas supply unit while the gas phase chamber is evacuated by the vacuum evacuation unit.

Device for supplying water containing dissolved gas and process for producing water containing dissolved gas

Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.

Cleaning method

A method for producing cleaning water for an electronic material, includes obtaining oxygen gas and argon gas from air with a PSA oxygen concentration apparatus, dissolving the oxygen gas and argon gas obtained from the PSA oxygen concentration apparatus in pure water or ultrapure water. A concentration of dissolved oxygen is in a range of 8 to 50 mg/L, and a content of dissolved argon gas is in a range of 2 to 50 volume % of a total amount of dissolved oxygen gas and the dissolved argon gas.

Method for producing cleaning water for an electronic material

An ultrapure water production facility and a method of monitoring ultrapure water include an ultrapure water production system, a first monitoring unit including a resistivity meter, a second monitoring unit including a dissolved gas concentration meter, a TOC meter, a hydrogen peroxide concentration meter, a silica meter, a boron meter, an evaporation residue meter, and a water temperature meter connected in parallel, and a third monitoring unit including a particle meter. The third monitoring unit is provided in parallel with the first monitoring unit and the first monitoring unit and the second monitoring unit are connected in series.

Ultrapure water production facility and method of monitoring ultrapure water

Raw water is made to pass through a raw water supply pipe by opening on-off valves, and by closing on-off valves. Oxygen is supplied to the raw water in the raw water supply pipe by opening an on-off valve of an oxygen supply pipe. The resulting raw water containing organic matter and oxygen passes through the raw water supply pipe and enters a catalyst-packed column, thereby contacting a platinum-group metal catalyst onto which hydrogen is adsorbed. This causes the organic matter in the raw water to contact the platinum-group metal catalyst under the presence of dissolved oxygen and hydrogen which is adsorbed onto the metal catalyst. Accordingly, the organic matter in the water to be treated can be easily removed at high efficiency and with low energy consumption.

Method and apparatus for treating organic matter-containing water

An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.

Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method

A process for producing a gas-containing cleaning water which contains a specific gas dissolved in water, which process comprises dissolving the specific gas into water under an increased pressure exceeding an atmospheric pressure to prepare a gas-containing water having a concentration of the gas exceeding solubility of the gas under an atmospheric pressure and, then, removing a portion of the dissolved gas by decreasing pressure on the gas-containing water; an apparatus for producing a gas-containing cleaning water which comprises an apparatus for dissolving a gas () in which a specific gas is dissolved into water under a pressure exceeding the atmospheric pressure and an apparatus for removing a portion of a dissolved gas () in which the pressure on the gas-containing water obtained from the apparatus for dissolving a gas is decreased to a pressure lower than the pressure under which the gas has been dissolved so that a portion of the dissolved gas is removed; and a cleaning apparatus using the gas-containing cleaning water. A gas-containing cleaning water having a desired concentration of the gas can be produced safely without using a mechanism for decreasing the pressure such as a vacuum pump. Water and the specific gas in the gas-containing cleaning water after being used can be reused. The process and the apparatuses can be advantageously applied to cleaning electronic members requiring a great degree of cleanliness.

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Tokyo, Japan

Hiroto Tokoshima