Sii Nanotechnology Inc.

Hiroto Muto

Kenichi Akamatsu

Takashi Ogawa

Compound charged particle beam device

Provided is a charged-particle beam apparatus capable of preventing a small amount of dust from being attached to an electrostatic lens serving as an objective lens to apply a high voltage to the electrostatic lens. The charged-particle beam apparatusincludes a chamberwhich has an interiorevacuated by an intra-chamber evacuating means, and a lens-barrelwhich emits a charged-particle beam Bonto a sample S put in the interiorof the chamber. The lens-barrelincludes a cylindrical bodywhich includes an emission outletfor emission of the charged-particle beam B, a charged-particle supply partwhich is housed at a side of a proximal endin an interiorof the cylindrical bodyand releases the charged-particle beam B, and an objective lenswhich is housed at a side of a distal endin the interiorof the cylindrical bodyand has an electrostatic lens for generating an electric field and converging the charged-particle beam Breleased from the charged-particle supply part. The cylindrical bodyof the lens-barrelis provided with a gas supplying meanscapable of supplying a gas G to the interiorof the cylindrical body, and the gas supplying meansis provided at a side of a proximal end of the objective lens

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Chiba, Japan

Hiroto Muto