Mitsubishi Gas Chemical Company, Inc.

Daicel Corporation

The School Corporation Kansai University

A School Corporation Kansai University

Hiroto Kudo

Masatoshi Echigo

Takashi Sato

Takumi Toida

Ichiro Takase

A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin are provided. The compounds and materials can provide for high solubility in a safe solvent.

Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin

Provided is a hyperbranched polymer having such a backbone that is readily decomposable by an acid. The hyperbranched polymer is derived from, via reaction, monomers including a monomer (X) and a monomer (Y). The monomer (X) contains three or more hydroxy groups per molecule. The monomer (Y) contains two or more groups represented by General Formula (y) per molecule. The monomer (X) includes at least one compound selected from the group consisting of cyclodextrins, compounds represented by General Formula (I), pillararenes, compounds represented by General Formula (II), compounds represented by General Formula (III), and compounds represented by General Formula (IV). The monomer (Y) includes a compound represented by General Formula (1). General Formulae (y), (I), (II), (III), (IV), and (1) are expressed as follows: 

Hyperbranched polymer, process for producing same, and composition

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Suita, Japan

Hiroto Kudo