Nikon Corporation

Hiroto Horikawa

Toshiya Ohtomo

Michael B Binnard

W Thomas Novak

Douglas C Watson

Hideo Mizutani

Tsuneyuki Hagiwara

Yutaka Hayashi

Hideaki Sakamoto

Hiromitsu Yoshimoto

Yoshifumi Nakakoji

Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.

Lithography apparatus and method utilizing pendulum interferometer system

A reticle holderhas; a first suction sectionfacing a precision warrantable area ARhaving a predetermined surface precision, of a lower face Ra of a reticle R; a second suction sectionfacing a precision unwarrantable area ARoutside of the precision warrantable area AR; a poreconnected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section, and a poreconnected to the suction apparatuswhich draws out gas in the space between the lower face Ra of the reticle R and the second suction section. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.

Holding apparatus, holding method, exposure apparatus and device manufacturing method

It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.

Stage unit, drive table, and scanning exposure apparatus using the same

A stage apparatus comprising a support device for supporting a table at its center of gravity and a drive device for driving the table at positions apart from the center of gravity of the table without contacting with the table. The stage apparatus effectively reduces stresses created in the table and/or any thermal deformation of the table. The table is connected to three pairs of table support bars on the stage through three respective plate springs so as to minimize any harmful deformation of the table, which could otherwise occur when the table is driven for motion or displacement in the Z-direction or for adjustment of the tilt of the table. The stage apparatus includes three drive units with respective drive pins for driving the stage. For example, when the three drive pins are driven simultaneously by the associated drive units, the table is caused thereby to translate along the Z-axis. The drive pins are so arranged as to provide support for the table at support points just under respective securing points on the table at which the table is secured to the plate springs and to provide a drive for the, table in the Z-direction at the support points. Thus, when driven by the drive pins, the table is only subject to compression forces acting thereon in the Z-direction and not to any moment.

Stage apparatus and exposure apparatus having the same

Stage unit, drive table, and scanning exposure and apparatus using same

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Kumagaya, Japan

Hiroto Horikawa