Ngk Insulators, Inc.

Nkg Insulators, Ltd.

Hirotake Yamada

Tsuneaki Ohashi

Hiroshi Furukubo

Hidenobu Misawa

Hiromichi Kobayashi

Makoto Murai

Yuji Katsuda

Shinji Kawasaki

Tomonori Takahashi

Yasushi Noguchi

Masaaki Masuda

Takao Soma

Shoji Seike

Hiroyuki Suenobu

Shigenori Ito

Yasufumi Aihara

Masao Nishioka

Ritsu Tanaka

Hiroyuki Iwasaki

Toshio Oda

Sadanori Shimura

Shinzou Hayashi

Kazuyo Mori

Tsutomu Naito

Masashi Harada

Hiroyuke Iwasaki

A ceramic porous body including at least Si as a chemical component, the ceramic porous body being obtained by adding a porous silica powder or a porous silica-containing compound powder to a forming raw material to prepare a clay, forming the resulting ceramic clay into a specific shape, and firing the formed product. The ceramic porous body according to the present invention does not produce carbon dioxide or toxic gas during firing and allows the firing time to be reduced in comparison with the case of using a resin powder or a carbon powder as a pore-forming agent by using the porous silica powder or the porous silica-containing compound powder as the pore-forming agent during production. Moreover, a change in pore-forming characteristics or deformation of a formed product rarely occurs.

Ceramic porous body and method for producing molded body

An integrated sintered body is provided having at least a first phase and a second phase. The first phase includes alumina as a main component, and the alumina contains a total amount of 12 weight percent or more and 50 weight percent or less of one or more of stabilized zirconia and partially stabilized zirconia. The second phase contains yttrium-aluminum garnet as a main component.

Integrated sintered bodies and a method of producing the same

The invention provides a film of an yttria-alumina complex oxide having a high peel strength with respect to a substrate. A mixed powder of powdery materials of yttria and alumina is sprayed on a substrate to form a sprayed film made of an yttria-alumina complex oxide. Preferably, the powdery material of yttria has a 50 percent mean particle diameter of not smaller than 0.1 &#x3bc;m and not larger than 100 &#x3bc;m, and the powdery material of alumina has a 50 percent mean particle diameter of not smaller than 0.1 &#x3bc;m and not larger than 100 &#x3bc;m. Preferably, the yttria-alumina complex oxide contains at least a garnet phase, and may further contain a perovskite phase.

Film of yttria-alumina complex oxide, a method of producing the same, a sprayed film, a corrosion resistant member, and a member effective for reducing particle generation

A ceramic member, which is usable in a state where at least a part thereof is exposed in a reactor in which halogen plasma is generated, includes a base member containing a first ceramic material, and a coating layer on a surface of the base member containing a second ceramic material more resistant to plasma etching than the first ceramic material. Further, the ceramic member includes a thick portion in a region where an etching rate of the coating layer by the halogen plasma is locally high, and a thickness (tt) of the thick portion and a thickness (tn) of a normal thickness portion other than the thick portion satisfy the following expression (1):tn&#x3c;tt&#x2266;(Ee/En)&#xd7;tn&#x2003;&#x2003;(1)where

Ceramic member

An object of the invention is to provide an yttria-alumina composite oxide film wherein peeling-off of the film from a substrate may be prevented. An intermediary layer is provided on a substrate containing at least one of alumina and yttria-alumina composite oxide as a main component. In the intermediary layer, a ratio (Y/A) of a molar ratio Y of yttria to a molar ratio A of alumina is not smaller than 0.1 and not larger than 0.9. An yttria-alumina composite oxide film is formed on the intermediary layer. A ratio (YAG (420)/M) of a peak intensity YAG (420) of a (420) plane of a garnet phase to a maximum peak intensity M of crystal phases other than the garnet phase is 2.5 or more in the yttria-alumina composite oxide film based on an X-ray diffraction measurement.

Yttria-alumina composite oxide films, laminated bodies having the same, a method for producing the same, and corrosion resistant members and films

A halogen gas plasma-resistant member to be exposed to a halogen gas plasma, includes a main body of said member, and a corrosion-resistant film formed at least a surface of said main body, wherein a peeling resistance of the corrosive film to said main body is not less than 15 MPa.

Halogen gas plasma-resistive members and method for producing the same, laminates, and corrosion-resistant members

The present invention provides a ceramic structure for improving the resistance against a corrosive substance and to diffuse and supply a fluid over a larger area of the structure. A ceramic laminated article has a ceramic sintered body, and a ceramic film provided on the sintered body by means of chemical vapor deposition. A hollow surrounded by the sintered body and film, and holes in communication with the hollow and the outside are formed in the article. A filling material is filled in the recess of the sintered body and the holes are formed. The thus obtained assembly is heat treated to dissipate and remove the filling material through the communicating holes, so that the recess is left as the hollow.

Ceramic laminated article, a method of producing the same and a ceramic laminate

The invention provides a film of an yttria-alumina complex oxide having a high peel strength with respect to a substrate. A mixture of powdery yttria and alumina materials is sprayed on a substrate to form a sprayed yttria-alumina complex oxide film. Preferably, the powdery yttria material has a 50 percent mean particle diameter in a range of 0.1 &mgr;m to 100 &mgr;m, and the powdery alumina material has a 50 percent mean particle diameter in a range of 0.1 &mgr;m to 100 &mgr;m. Preferably, the yttria-alumina complex oxide contains at least garnet phase, and may further contain perovskite phase.

A film structure including a silicon carbide film formed on a surface of an aluminum nitride substrate. The substrate has a first base plane, a second base plane positioned downward with respect to the first base plane and a step plane arranged in an intersecting direction between the first base plane and the second base plane. One or more chamfered planes are arranged between the first base plane and the step plane so as to form a plurality of corner portions each having an angle larger than 130&deg;. Alternatively, at least one round portion having a curvature radium of larger than 0.05 mm is arranged between the first base plane and the step plane.

Method of forming silicon carbide film on aluminum nitride, film structure and silicon carbide film

To prevent an exposed surface of an anticorrosive part for an etching apparatus from being corroded, even when a highly corrosive etching gas such as a chlorine-based or fluorine-based plasma gas is used, an anticorrosive part for the etching apparatus for effecting etching treatment is provided. The anticorrosive part includes an anticorrosive part substrate, and a film of silicon carbide covering that surface of the anticorrosive part substrate which is to be exposed to an etching gas, wherein the silicon carbide film is made of polycrystals of silicon carbide having a 3C crystalline system, and (111) planes of the silicon carbide polycrystals are oriented in parallel to the surface of the silicon carbide film.

Anti-corrosive parts for etching apparatus

A silicon carbide body includes polycrystals of silicon carbide, and has a purity of silicon carbide of not less than 99.9999 wt %, a relative density of not less than 99% and a ratio of silicon of not less than 70.12 wt %.

Silicon carbide body

A method for producing a silicon carbide body, includes the steps of forming a silicon carbide mass by chemical vapor deposition, and thermally treating the silicon carbide mass under vacuum or in an inert gas atmosphere at a temperature not less than 2000&deg; C., the silicon carbide article having an electric resistivity higher than that of the silicon carbide mass having not been thermally treated.

Production of silicon carbide bodies

A porous sintered body is composed of a perovskite-type composite oxide, wherein A-site of the composite oxide are occupied by one or more kinds of first metallic elements selected from the group consisting of calcium and strontium, one or more kinds of second metal elements selected from the group consisting of rare earth elements and yttrium excluding lanthanum and cerium, and lanthanum, the above one or more kinds of the first metallic elements amount to 5 to 70 mol % of the A-sites, and manganese is contained in B-sites of the composite oxide.

Porous sintered bodies and solid oxide fuel cells using such porous

An air electrode as a component of a solid electrolyte fuel cell. The air electrode is composed of a first layer and a second layer. The first layer has an open porosity of 25% to 57%, pore diameters of 2.5 .mu.m to 12 .mu.m and a resistivity of less than 0.22 .OMEGA.cm. The second layer has an open porosity of 8% to 24%, pore diameters of 0.2 .mu.m to 3 .mu.m, and a ratio of the thickness of the second layer to the thickness of the air electrode is 2% to 28%. The sum of the thicknesses of the first and second layers is 0.7 mm to 3.0 mm. The materials of the first and second layers have perovskite structures selected from the group consisting of lanthanum manganate, calcium manganate, lanthanum nickelate, lanthanum cobalate and lanthanum chromate. A solid electrolyte fuel cell includes the air electrode as described above, a solid electrolyte film formed on the surface of the second layer of the air electrode and a fuel electrode film formed on the surface of the solid electrolyte film.

Air electrode and solid electrolyte fuel cell having the same

A process for forming a ceramic thin film on a surface of a ceramic body, including the steps of preparing an annular body from a ceramic green sheet, inserting the ceramic body into the annular body, and firing the thus assembled annular body and ceramic body, whereby the annular body is shrunk and joined to the ceramic body.

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Anjyo, Japan

Hirotake Yamada