Nagoya University

Tokyo Electron Limited

Sumitomo Riko Company Limited

Tokai National Higher Education and Research System

Hirotaka Toyoda

Masaru Hori

Hitoshi Itoh

Makoto Sekine

Haruka Suzuki

Hidenori Miyoshi

Kensuke Sasai

Yusuke Kubota

A waveguide has a first conductor surface facing toward the interior of the waveguide, a second conductor surface facing toward the interior of the waveguide, and a slot extending from the first conductor surface to the outside of the waveguide. The first conductor surface and the second conductor surface electrically communicate with each other and face each other. The first length in the y direction of the first conductor surface in a cross section perpendicular to the z direction is smaller than the second length in the y direction of the second conductor surface in the cross section perpendicular to the z direction. The first length includes the length in the y direction of the slot in the cross section perpendicular to the z direction. The second length is smaller than the distance between the first conductor surface and the second conductor surface in the x direction.

Plasma generation apparatus

A microwave supply apparatus includes a waveguide, a circulator, and a matcher, a first port of the circulator receives a microwave from an input end. First and second ends of the waveguide are coupled to second and third ports of the circulator, respectively. The matcher is provided between the input end and the first port of the circulator. The waveguide includes a rectangular waveguide having first and second walls facing each other, and third and fourth walls facing each other. A slot hole is formed in the first wall, and the slot hole is provided at a region deviated to the third wall side. The waveguide includes a first ridge portion provided therein. The first ridge portion faces the slot hole, is in contact with the second wall and third wall, and is separated from the first wall and fourth wall.

Microwave supply apparatus, plasma processing apparatus, and plasma processing method

A microwave plasma generation apparatus () includes: a rectangular waveguide () that transmits a microwave; a slot antenna () that has a slot () through which the microwave passes; and a dielectric portion () that is arranged so as to cover the slot () and of which a plasma generating region-side front face is parallel to an incident direction in which the microwave enters from the slot (). The microwave plasma generation apparatus () is able to generate microwave plasma (P) under a low pressure of lower than or equal to 1 Pa. A magnetron sputtering deposition system () includes the microwave plasma generation apparatus (), and carries out film deposition using magnetron plasma (P) while radiating microwave plasma (P) between a base material () and a target (). With the magnetron sputtering deposition system (), it is possible to form a thin film having small asperities on its surface.

High density microwave plasma generation apparatus, and magnetron sputtering deposition system using the same

A microwave waveguide apparatus for generating plasma includes a waveguide which has first and second ends and propagates microwave from input end such that the microwave propagates from the first end to the second end, a circulator device having a first port, a second port coupled to the first end, and a third port coupled to the second end, the circulator device being structured such that the microwave is received at the first port, propagates from the second port to the first end, is received at the third port from the second end and is returned toward the input end, and a matching device which is interposed between the input end and the circulator device and reflects part of the microwave received at the third port and returned toward the input end to the first port. The waveguide has a slot-hole extending along the microwave propagation direction in the waveguide.

Microwave waveguide apparatus, plasma processing apparatus and plasma processing method

An apparatus for generating plasma, comprises: a microwave generator configured to generate a microwave; a wave guide which is connected to the microwave generator, wherein the wave guide is elongated in a traveling direction of the microwave and has a hollow shape having a rectangular section in a direction perpendicular to the traveling direction; a gas feeder which is connected to the wave guide and feeds process gas into the wave guide; and an antenna unit which is a part of the wave guide and discharges plasma generated by the microwave to the outside, wherein the antenna unit has one or more slots formed on a wall constituting a short side in a section of the antenna unit, plasmarizes the process gas fed into the wave guide under an atmospheric pressure in the slots by the microwave, and discharges the plasma out of the slots.

Growing community of inventors

Nagoya, Japan

Hirotaka Toyoda