Mitsubishi Heavy Industries Thermal Systems, Ltd.

Mitsubishi Heavy Industries Limited

Hirotaka Oka

Tatsuo Ishiguro

Katsuaki Morita

Satoshi Nikaido

Noriyuki Matsukura

Ryuji Ikeda

Sota Kogawa

Kenichi Nagahara

Yuki Nishizaki

Masumi Nomura

Kenji Muta

Kohei Kawazoe

Tatsuyuki Nishimiya

A monitoring device includes: an operation record acquisition unit configured to acquire operation records indicating a transition in a load factor or a load change factor with respect to operation time leading up to failure in failure cases; a threshold setting unit configured to set a threshold to be contrasted with the load factor or the load change factor in the operation records of the failure cases; a wear rate acquisition unit configured to acquire a wear rate that is a value derived from a relation between the load factor or the load change factor and the threshold and indicates a degree of progress of wear of a device according to operation time; and a failure rate cumulative frequency acquisition unit configured to acquire a transition in a failure rate cumulative frequency of the failure cases with respect to the wear rate.

Monitoring device and monitoring method

An estimation device includes an observation system constraint determination unit configured to determine data within constraints that is data within a first constraint based on time series data of each observation value of a first observation value observed by a first observation system and a second observation value observed by a second observation system, a model estimation unit configured to estimate parameters of a plurality of models including an observation model that is a model of each of the observation systems and a physical model that is a model within an apparatus provided with each of the observation systems based on the data within constraints, and a consistency determination unit configured to determine consistency of the models based on a deviation between a first predicted observation value predicted from the second observation system based on the estimated parameters and the first observation value.

Estimation device and estimation method

An abnormality diagnosis device includes an abnormality determination unit configured to determine whether or not there is an abnormality with respect to a state quantity acquired from equipment and a cause estimation unit configured to estimate a cause of the abnormality in the equipment from a state quantity determined to be abnormal by the abnormality determination unit using a cause correspondence table in which a cause of an abnormal mode of the equipment identified in fault tree analysis is associated with the state quantity that is abnormal when the cause has occurred.

Abnormality diagnosis device and abnormality diagnosis method

A gas analysis system includes: a laser light source for emitting a laser light to be transmitted through an analysis target gas; a photodetector configured to receive the laser light transmitted through the analysis target gas, for outputting a signal corresponding to an emission intensity of the received laser light; a gas analysis apparatus for analyzing the analysis target gas on the basis of the signal outputted from the photodetector; a variable light attenuator disposed between the analysis target gas and the laser light source; a transmitted-light amount detector configured to evaluate a transmitted light amount of the laser light transmitted through the analysis target gas on the basis of the signal outputted from the photodetector; and an attenuation amount controller configured to control an attenuation amount of the variable light attenuator on the basis of the transmitted light amount of the laser light evaluated by the transmitted-light amount detector.

Gas analysis system and boiler

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Tokyo, Japan

Hirotaka Oka