Nippon Sheet Glass Company, Limited

Olympus Corporation

Hirotaka Koyo

Satoshi Tanaka

Keiji Tsunetomo

Yasuhiro Saito

Shinya Okamoto

Yasushi Nakamura

Takeshi Hidaka

Akihiro Koyama

Junji Kurachi

Kazuishi Mitani

Hiroaki Kasai

Masamichi Hijino

Keiko Tsuri

Tadashi Koyama

Koichi Sakaguchi

Tetsuo Minaai

Tatsuhiro Nakazawa

Teruhide Inoue

Tomonori Imamura

Masanori Shojiya

A vacuum glass panel including a vacuum glass, a sash, and a grazing gasket is provided. The vacuum glass includes a first glass plate, a second glass plate having substantially the same area as the area of the first glass plate in a front view, and a depressurized layer arranged between the first glass plate and the second glass plate opposed to the first glass plate. The lower face of the first glass plate and the lower face of the second glass plate are misaligned relative to each other in the vertical direction. The sash includes two groove walls that define a groove for receiving the upper, lower, right, and left peripheral edge portions of the vacuum glass in a front view. The grazing gasket is arranged on at least the lower portion of the vacuum glass inside the groove and seals a gap between the vacuum glass and the groove walls, and includes a clamping portion for clamping the vacuum glass from a first outer principal surface of the first glass plate and a second outer principal surface of the second glass plate near the top portions of the groove walls.

Vacuum glass panel

The glass sheet production method of the present invention is a method for producing a surface-modified glass sheet, including a gas contact step of bringing hydrogen fluoride (HF) gas, hydrogen chloride (HCl) gas, and water vapor into contact with at least one principal surface of a glass sheet. A gas containing the hydrogen fluoride (HF) gas is used in the gas contact step, and in the gas containing the hydrogen fluoride (HF) gas, a volume ratio of the water vapor to the hydrogen fluoride (HF) gas (volume of water vapor/volume of HF gas) is 8 or more.

Method for producing glass sheet, and glass sheet

The present invention provides a glass composition that allows holes with a circular contour and a smooth inner wall to be formed by a collective micro-hole-forming process using a combination of modified portion formation by ultraviolet laser irradiation and etching, the glass composition being adapted for practical continuous production. The present invention relates to a glass for laser processing, the glass having a glass composition including, in mol %: 45.0%&#x2264;SiO&#x2264;70.0%; 2.0%&#x2264;BO&#x2264;20.0%; 3.0%&#x2264;AlO&#x2264;20.0%; 0.1%&#x2264;CuO&#x2264;2.0%; 0%&#x2264;TiO&#x2264;15.0%; and 0%&#x2264;ZnO&#x2264;9.0%, wherein a relationship of 0&#x2264;LiO+NaO+KO&#x3c;2.0% is satisfied.

Glass for laser processing and method for producing perforated glass using same

The glass sheet production method of the present invention includes the steps of: (I) bringing a first acid gas into contact with at least one principal surface of a sheet-shaped glass material, the first acid gas containing hydrogen fluoride (HF) gas but not containing hydrogen chloride (HCl) gas and having a volume ratio of water vapor to HF gas of less than 8, the glass material containing at least sodium as a component and having a temperature in a range from a glass transition temperature to a temperature 250&#xb0; C. higher than the glass transition temperature; (II) before or after the step (I), bringing a second acid gas into contact with the principal surface of the sheet-shaped glass material, the second acid gas containing HCl gas and optionally containing HF gas, wherein when the second acid gas contains both HCl gas and HF gas, the second acid gas further contains water vapor with a volume ratio of water vapor to HF gas of 8 or more; and (III) cooling the sheet-shaped glass material having undergone both the step (I) and the step (II) so as to obtain a glass sheet.

Method for producing glass sheet

A glass substrate processing method includes irradiating laser light L onto a glass substratesuch that the laser light L is focused within the glass substrate, thereby forming a high density areathat has a higher density than areas where the laser light L is not irradiated around the portion where the laser light L is focused; and performing chemical etching on the glass substrateusing an etching solution such that at least a portion of the high density area is allowed to remain, thereby forming a projectionon a surfaceof the glass substrate

Glass substrate processing method and glass component

Titanium is added in the form of atoms, a colloid, or ions to a glass to be subjected to laser processing in which the ablation or vaporization caused by the energy of an absorbed laser light is utilized. Since titanium can be incorporated into the glass through melting, the threshold value for processing can be easily regulated by changing the amount titanium to be added and a material having evenness in processability can be obtained.

Glass for laser processing

The present invention improves a method of forming a surface unevenness using a difference in etching rates, and relaxes limitations on substrates in this method. In a method of the present invention, an uneven surface is formed by a method including applying pressure to a predetermined region in a surface of a thin film formed on a substrate, and etching a region including at least a portion of the predetermined region and at least a portion of the reminder of the surface that excludes the predetermined region. An etching rate difference within the thin film increases freedom in selecting a substrate material.

Method of manufacturing article having uneven surface

A glass for laser processing of the present invention can be laser-processed by causing ablation or evaporation by laser beam energy absorbed therein, wherein the glass for laser processing has a composition that satisfies the following conditions:60&#x2266;SiO+BO&#x2266;79 mol %;5&#x2266;AlO+TiO&#x2266;20 mol %; and5&#x2266;LiO+NaO+KO+RbO+CsO+MgO+CaO+SrO+BaO&#x2266;20 mol %,where 5&#x2266;TiO&#x2266;20 mol %. The present invention can provide a glass for laser processing that has a low laser processing threshold value as well as a low thermal expansion coefficient.

A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof, and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.

Processing method for glass substrate, processed glass product and stress applying apparatus

A limited portion of a surface of a glass substrate is removed by application of a laser beam on the limited portion of the glass substrate to thereby produce a glass structure according to the invention. The glass substrate contains at least one element such as titanium, iron, vanadium, bismuth, lead, thallium, tin, cerium, rhodium or cobalt capable of absorbing energy of the laser beam and has a threshold of not larger than 1.0 J/cmper laser beam pulse in terms of machining energy of the laser beam. When such a glass substrateis used, a glass structure having a through-holeor cavity optional in sectional shape can be formed by irradiation with the laser beam

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Hyogo, Japan

Hirotaka Koyo