Nikon Corporation

Nikon Engineering Co., Ltd.

Hirotaka Kohno

Yasufumi Nishii

Hiroyuki Nagasaka

Kenichi Shiraishi

Soichi Owa

Nobutaka Magome

Shigeru Hirukawa

Hiroaki Takaiwa

Masahiro Nei

Yoshihiko Kudo

Jiro Inoue

Motokatsu Imai

Tomoyuki Matsuyama

Shintaro Kudo

Takeshi Okuyama

Katsushi Nakano

A simulation apparatus has: a first processing part configured to obtain a value of a parameter in a first set relating to the forming of the pattern; a second processing part configured to obtain a value of a parameter in a second set that is at least partially same as the parameter in the first set and relating to the forming of the pattern; and an integration processing part configured to evaluate, based on the value of the parameter in the first set and the value of the parameter in the second set, a state of the pattern formed on the substrate and a forming condition when the pattern is formed, and to determine based on the result of the evaluation whether or not to make at least one of the first processing part and the second processing part recalculate the value of the parameter in the corresponding set.

Lithography system, simulation apparatus, and pattern forming method

An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Exposure method, substrate stage, exposure apparatus, and device manufacturing method

A stage apparatus PST is provided with a holder PH, which has a substrate holding surfaceA that holds a substrate P; a stage, which supports and moves the holder PH; and a recovery apparatus, which is disposed in the vicinity of the holder PH and has lyophilic partsof which at least a part of each is lyophilic, that uses the lyophilic partsto recover a liquid. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.

Exposure apparatus, and exposure method, with recovery device to recover liquid leaked from between substrate and member

A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.

Exposure apparatus and method for producing device

An exposure apparatus where liquid supply operation and liquid recovery operation for forming a liquid immersion region are excellently performed to form the liquid immersion region in a desired condition, enabling high exposure accuracy and measurement accuracy to be achieved. An exposure apparatus (EX) is an apparatus that exposes a substrate (P) by emitting exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus has a liquid supply mechanism () having a supply opening () capable of supplying the liquid (LQ) in the direction substantially parallel to the surface of the substrate (P).

Exposure apparatus and device manufacturing method

An exposure apparatus is provided that performs well a liquid supply operation for forming a liquid immersion region and a liquid recovery operation to form a liquid immersion region in a desired state, thereby allowing high exposure accuracy and high measurement accuracy. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a liquid (LQ), and includes a liquid supply mechanism () that has a supply port () capable of supplying the liquid (LQ) substantially in parallel with a surface of the substrate (P).

Stage apparatus, exposure apparatus, and exposure method with recovery device having lyophilic portion

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Kumagaya, Japan

Hirotaka Kohno