Fujifilm Corporation

Hirotaka Kitagawa

Yuichiro Enomoto

Yuichiro Goto

Tadashi Oomatsu

Akihito Amao

Koji Yasuda

Akiko Hattori

Kunihiko Kodama

Toshihiro Kamada

Takayuki Ito

Yoshio Inagaki

Takahiro Kato

Kenichi Kodama

Tadashi Omatsu

Shinji Tarutani

Takashi Katoh

Yasufumi Ooishi

Masafumi Yoshida

Kenta Yoshida

Kazuyuki Usuki

Toshihiro Kamata

An object of the present invention is to provide a liquid crystal polymer film having a low dielectric loss tangent. In addition, an object of the present invention is to provide a laminate having the liquid crystal polymer film. The liquid crystal polymer film includes a liquid crystal polymer and a filler, in which, in a case where the liquid crystal polymer film includes one kind of the filler, a dielectric loss tangent of the filler under conditions of 25&#xb0; C. and a frequency of 10 GHz is 0.0020 or less, and in a case where the liquid crystal polymer film includes two or more kinds of the fillers, a mass average value of dielectric loss tangents of the two or more kinds of the fillers under the conditions of 25&#xb0; C. and a frequency of 10 GHz is 0.0020 or less, and a ratio of a volume occupied by the filler is 10% by volume or more with respect to a total volume of the liquid crystal polymer film.

Liquid crystal polymer film and laminate

Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (&#x394;LWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where Rrepresents a hydrogen atom or a methyl group; Rrepresents an alkyl group which may be substituted with a fluorine atom, Rrepresents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, Rto Reach independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in Rand Ris 1 to 6, and Rand R, or Rand Rmay be bonded to each other and form a ring. 

Photocurable composition, pattern forming method, and method for manufacturing device

A resin composition for underlayer film formation capable of forming an underlayer film having good adhesiveness and excellent surface flatness, a layered product, a method for forming a pattern and a process for producing a device are provided. The resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and a group represented by General Formula (B), and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represents an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring. 

Resin composition for underlayer film formation, layered product, method for forming pattern, and process for producing device

A curable composition for optical imprinting which is excellent in ink jet adequacy and releasability, a pattern forming method, a fine pattern, and a method for manufacturing a semiconductor device are provided. The curable composition for optical imprinting contains a polymerizable compound (A), a photopolymerization initiator (B), and a compound (C) expressed by General Formula (I); in General Formula (I), A represents a dihydric to hexahydric polyhydric alcohol residue. p represents 0 to 2, l q represents 1 to 6, p+q represents an integer of 2 to 6, each of m and n independently represents 0 to 20. r expressed by Formula (1) is 6 to 20. Each R independently represents an alkyl group having 1 to 10 carbon atoms, an aryl group, or an acyl group. 

Curable composition for optical imprinting and pattern forming method

Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.

Under layer film-forming composition for imprints and method for forming pattern

Provided are a photocurable composition for imprints, having good releasability and temporal stability of the releasability, a pattern forming method, and a method for manufacturing a device. This photocurable composition for imprints includes a monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom, a bifunctional or higher polyfunctional (meth)acrylate (A2) not containing a fluorine atom, a monofunctional (meth)acrylate (B) containing a fluorine atom, a photopolymerization initiator (C), and a non-polymerizable compound (D) having a polyoxyalkylene structure in a proportion of 1% to 5% by mass, in which the monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom has a boiling point of 100&#xb0; C. to 200&#xb0; C. at a pressure of 0.67 kPa, and the monofunctional (meth)acrylate (B) containing a fluorine atom has a boiling point of 100&#xb0; C. to 200&#xb0; C. at a pressure of 0.67 kPa.

Photocurable composition for imprints, pattern forming method, and method for manufacturing device

Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device

Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device. The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate. 

Curable composition, pattern forming method, pattern, and method for manufacturing device

Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent. Rrepresents a hydrogen atom or a methyl group, Rand Reach independently represent a group selected from an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rrepresents a group selected from an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms and an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rand Rmay be bonded to each other to form a ring. 

Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit and process for producing device

Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. The curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a Cfluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; Rrepresents a Csubstituent being free from a polymerizable group; Rrepresents a hydrogen atom, Csubstituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; Rand Rmay combine with each other to form a ring. 

Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device

Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A);

Curable composition for imprints, patterning method and pattern

The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200&#xb0; C. in an amount of 5% by mass of the composition.

Inkjet discharge method, pattern formation method, and pattern

An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

Under layer film-forming composition for imprints and method of forming pattern

Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger:the Ohnishi parameter=(total number of atoms)/(number of carbon atoms&#x2212;number of oxygen atoms).&#x2003;&#x2003;(Equation 1)

Underlay film composition for imprints and method of forming pattern and pattern formation method using the same

To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25&#xb0; C. of 15 mPa&#xb7;s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cmor larger;Crosslink density={&#x3a3;(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity.

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Haibara-gun, Japan

Hirotaka Kitagawa