Canon Kabushiki Kaisha

Hirotaka Fukushima

Satoko Midorikawa

Seiichi Hata

Yusuke Owaki

Shigeru Tanaka

Toshinori Nakayama

Ryuji Biro

Minoru Otani

Yoshiko Igarashi

Hidetaka Nanao

Junzo Kobayashi

Yasushi Hoshi

An amorphous alloy contains Ni and Nb and has a composition including at least one of: a composition containing Nb with a content in the range of 35.6 atomic % to 75.1 atomic %, Ir with a content in the range of 7.2 atomic % to 52.3 atomic %, and Ni with a content in the range of 4.0 atomic % to 48.5 atomic %; a composition containing Nb with a content in the range of 19.6 atomic % to 80.9 atomic %, Re with a content in the range of 7.4 atomic % to 59.2 atomic %, and Ni with a content in the range of 4.1 atomic % to 56.9 atomic %; and a composition containing Nb with a content in the range of 7.5 atomic % to 52.9 atomic %, W with a content in the range of 16.4 atomic % to 47.0 atomic %, and Ni with a content in the range of 22.0 atomic % to 53.3 atomic %.

Amorphous alloy, molding die, and method for forming optical element

The fixing device having a long durability life includes a first member, a heater, and a second member, the heater including a base material, an intermediate layer on the base material, and a surface layer on the intermediate layer, which includes a diamond-like carbon film, the base material containing at least one compound selected from the group consisting of aluminum nitride, aluminum oxide, and silicon nitride, and the intermediate layer has a ratio of [(Si)+(C)]/A of 0.8 or more, and a ratio of (Si)/(C) of more than 1.

Heat fixing device, electrophotographic image forming apparatus, and laminated structural body

A thermal fixing apparatus, including a rotatable first member; a heater heating the first member; a rotatable second member forming a nip portion with the first member; and a pressurizing member disposed inside the first member, and having a contact surface with an inner surface of the first member. The pressurizing member includes a surface layer constituting the contact surface, and the surface layer comprises a diamond-like carbon film containing a hydrogen atom (H), a carbon atom (C) and a silicon atom (Si). 100&#xd7;(H)/((H)+(C)) is 5 or less. 100&#xd7;(Si)/((Si)+(C)) is 1 to 20. Between the contact surface and an inner circumferential surface of the first member, an oil film containing a fluorinated oil and a silicone oil is present.

Thermal fixing apparatus and image forming apparatus

A fixing device capable of stably performing a fixing operation for a long time is provided. The fixing device includes a cylindrical fixing belt and a heater. The fixing belt includes a resin layer forming an inner circumferential surface contactable with the heater. The heater includes a surface layer forming a sliding surface sliding on the fixing belt. The surface layer is an amorphous carbon film containing graphite particles. The sliding surface includes protrusions derived from the graphite particles. The protrusions have a distribution density of 50 to 2000 per 1 square millimeter of the sliding surface.

Fixing device and image forming apparatus

Amorphous alloy molding die and method for forming optical element

An amorphous alloy contains 68 atomic % or more and 86 atomic % or less of Re, 8 atomic % or more and 12 atomic % or less of Hf, and 0.1 atomic % or more and 5 atomic % or less of O.

Amorphous alloy, molding die, and method for molding optical element

An amorphous alloy contains 54 at % or more and 79 at % or less Re, 8 at % or more and 28 at % or less Ir, and 11 at % or more and 18 at % or less Nb. A molding die includes a release film composed of the amorphous alloy. A method for producing an optical element, the method including press-molding a glass preform with the molding die.

Amorphous alloy, molding die, and method for producing optical element

In an anti-reflective film including alternating layers of high refractive-index layers and low refractive-index layers, by designing such that a designed central wavelength &#x3bb;is within a wavelength range of 141 nm to 189 nm, and that when the first to eighth layers as counted from a substrate have optical film thicknesses dto drespectively, the equations of:0.45&#x3bb;&#x2266;d&#x2266;0.65&#x3bb;;0.05&#x3bb;&#x2266;d&#x2266;0.20&#x3bb;;0.29&#x3bb;&#x2266;d&#x2266;0.49&#x3bb;;0.01&#x3bb;&#x2266;d&#x2266;0.15&#x3bb;;0.05&#x3bb;&#x2266;d&#x2266;0.20&#x3bb;;0.23&#x3bb;&#x2266;d&#x2266;0.28&#x3bb;;0.23&#x3bb;&#x2266;d&#x2266;0.28&#x3bb;; and0.23&#x3bb;&#x2266;d&#x2266;0.28&#x3bb;are satisfied, the anti-reflective film can be formed so as to have a low reflectance for a light incident at such a large angle as 30 degrees or more, without increasing the whole thickness of the film.

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Utsunomiya, Japan

Hirotaka Fukushima