Fujitsu Corporation

Adv Antest Corporation

Matsushita Electric Industrial Co., Ltd.

Sony Corporation

Showa Denko K.k.

Sankyo Company, Limited

Ricoh Company, Ltd.

Kabushiki Kaisha Toshiba

Tokyo Shibaura Denki Kabushiki Kaisha

Mitsubishi Materials Corporation

Fujitsu Vlsi Limited

Idemitsu Kosan Company, Limited

Matsushita Electronics Corporation

Denki Kagaku Kogyo Kabushiki Kaisha

Showa Denko Kabushiki Kaisha

Hiroshi Yasuda

Yoshihisa Oae

Akio Yamada

Tomohiko Abe

Junichi Kai

Takamasa Satoh

Kiichi Sakamoto

Soichiro Arai

Kenichi Miyazawa

Yoshihisa Ooaeh

Yoshihisa Ooae

Hidefumi Yabara

Hideki Nasuno

Shigeru Maruyama

Hisayasu Nishino

Keiichi Betsui

Takeshi Haraguchi

Satoru Yamazaki

Katsuhiro Takahashi

Masami Takigawa

Isamu Seto

Yasushi Takahashi

Tatsuro Ohkawa

Takashi Kiuchi

Hitoshi Tanaka

Kiyofumi Ochii

Satoshi Yokoya

Shunsuke Fueki

Kenichi Kawakami

Kazuyoshi Yonezu

Tomohiro Sakazaki

Takayuki Sakakibara

Hiroyuki Nakamura

Atsushi Saito

Shinichi Hamaguchi

Morihiko Hayashi

Toshiyuki Konosu

Masashi Ito

Sadao Oida

Nobuyuki Yasutake

Mitsuhiro Nakano

Kazushi Ishida

Noriko Takeda

Michihito Nakagawa

Naoto Hoshihara

Fujio Masuoka

Hiroyuki Kojima

Shinji Imoto

Takashi Yamaguchi

Isao Kawamoto

Toshiki Itoi

Kenzo Yamamoto

Kenichi Kawashima

Satoshi Ohya

Rokuro Endo

Eiji Nakayama

Hideomi Sakuma

Masao Miyauchi

Yukio Utsui

Yawara Tajima

Takeo Miyaoka

Nobutaka Takao

Masatoshi Murakami

Akiyoshi Tsuda

Shinichi Tanaka

Makoto Saito

Kazuo Sato

Masataka Takeuchi

Akio Nodera

Takeshi Takemoto

Hiroshi Okamoto

Haruo Isaka

Nobuhiko Watanabe

Yoshio Watanabe

Kuniyoshi Marui

Yoshinori Terui

Kuniomi Marumo

Kohei Morikawa

Hitoshi Watanabe

Ryozo Nonogaki

Yusuke Hayata

Kenji Kobayashi

Shuichi Obata

Mitsuo Nagano

Moritaka Nakamura

Jiro Yamada

Hideo Takeshiba

Haruaki Ito

Koichi Hirai

Masaaki Miyajima

Sumio Soya

Noboru Someno

Junzo Tobitsuka

Tetsuo Maeda

Hisaki Kajino

Tsuyoshi Takayama

Norio Numata

Yukiyoshi Takahi

Manabu Ohno

Ryuji Oki

An electron gun device according to the present invention emits an electron beam by means of heating to a high temperature in a vacuum. According to the present invention, the surface of a material (), which emits an electron beam, is a hydrogenated metal that is melted and in a liquid state during a high-temperature operation; the liquid hydrogenated metal is contained in a hollow cover tube container (), which is in a solid state during the high-temperature operation, in the form of a hydrogenated liquid metal or in the form of a liquid metal before hydrogenation, and heated together with the cover tube container () to a high temperature; subsequently, the hydrogenated liquid metal is exposed from the cover tube container () and forms a liquid surface where gravity, the electric field and the surface tension of the liquid surface are balanced; and an electron beam is emitted from the exposed surface of the hydrogenated liquid metal.

Electron gun device

There provided a device for effectively drawing a fine pattern using a permanent magnet. The device has an outer cylindercomposed of a cylindrical ferromagnet with a Z axis as a central axis, a cylindrical permanent magnetlocated inside the outer cylinder and polarized along the Z axis direction, a correction coillocated inside the cylindrical permanent magnet with a gap from the cylindrical permanent magnet, for adjusting a magnetic field strength generated by the cylindrical permanent magnet along the Z axis direction, and a coolant passagelocated in the gap between the cylindrical permanent magnet and the correction coil, for allowing a coolant to flow therethrough and controlling temperature changes in the cylindrical permanent magnet.

Tubular permanent magnet used in a multi-electron beam device

An electron gun cathode () is column shaped, and emits electrons by being heated. A holder (), which covers the bottom and sides of the electron gun cathode, has electrical conductivity and holds the electron gun cathode, and is composed of a material that does not easily react with the electron gun cathode when in a heated state, is provided. The tip of the electron gun cathode () protrudes from the holder () so as to be exposed, and electrons are emitted from the tip toward the front by applying an electric field to the tip.

Electron gun and electron beam device

A high-accuracy and high-speed lithographic pattern is acquired by forming a square lattice matrix beam group with an interval which is an integral multiple of a beam size in a two-dimensional plane, switching on and off the mesh of a device to be drawn by a bitmap signal, forming a desired beam shape, deflecting the beam to a necessary position, and radiating a beam with a whole blanker being opened after the beam state is stabilized. On and off signals and a vector scan signal of each beam are provided, and the whole blanker is released after the beam is stabilized, and thus high-accuracy and high-speed lithography is performed with a small amount of data. When the total number of shots exceeds a constant value, the pattern data are modified and high-speed lithography is achieved. A semiconductor reversed bias p-n junction technique is preferably used for an individual blanker electrode.

Electron beam lithography device and lithographic method

An electron beam lithography apparatus includes a storage for storing data on a drawing pattern assigned a rank based on an accuracy required for a device pattern, a drawing pattern adjustment unit to generate data on divided drawing patterns based on the rank, a settlement wait time adjustment unit to determine a settlement wait time based on the rank, and a controller to draw the device pattern while irradiating an electron beam based on the data on the divided drawing patterns and the settlement wait time. The drawing pattern adjustment unit determines upper limits on the long-side length of a divided drawing pattern or on the area of the divided drawing pattern based on the rank, and divides the drawing pattern based on the upper limits.

Electron beam lithography apparatus and electron beam lithography method

A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, the two annular permanent magnets being magnetized in an optical axis direction and symmetrical about the optical axis, where the electromagnetic coils adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, where the electron beam converging unit is disposed in each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.

Multi-column electron beam exposure apparatus and magnetic field generation device

An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.

Electron gun minimizing sublimation of electron source and electron beam exposure apparatus using the same

A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.

Multi-column electron beam exposure apparatus and multi-column electron beam exposure method

Provided is an aromatic polycarbonate resin composition including a combination composed of 98 to 1 mass % of an aromatic polycarbonate (A), 1 to 98 mass % of an aliphatic polyester (B), and 1 to 80 mass % of an organic filler derived from a natural product (C), the aromatic polycarbonate resin composition being obtained by suppressing increase in density of an aromatic polycarbonate resin composition containing an aliphatic polyester, while improving rigidity and fluidity thereof and ameliorating poor external appearance such as pearly luster.

Aromatic polycarbonate resin composition and molded article thereof

An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB) or cerium hexaboride (CeB). The electron emission restrictive region may be covered with carbon.

Electron gun, electron beam exposure apparatus, and exposure method

An electron beam exposure system is designed to correct a proximity effect. The electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions that are arranged so that sizes of the opening portions change at a predetermined rate in order of arrangement; a mask deflection unit for deflecting the electron beam on the electron beam exposure mask; a substrate deflection unit for deflecting and projecting the electron beam onto a substrate; and a control unit for controlling deflection amounts in the mask deflection unit and the substrate deflection unit. The direction or directions of the change may be any one of a row direction and a column direction or may be the row and column directions.

Electron beam exposure mask, electron beam exposure method, and electron beam exposure system

Provided is an electron beam exposure apparatus for forming a desired pattern on a sample mounted on a wafer stage by exposure with an electron beam generated form an electron gun. The electron beam exposure apparatus includes: supplying device of injecting a reducing gas into a column in which the electron gun and the wafer stage are housed; and control unit of performing control so that the injection of the reducing gas into the column is continued for a predetermined period of time. Organic contamination is combined with H generated from the reducing gas by irradiation of an electron beam, and then evaporates. Further included is supplying device of injecting an ozone gas into the column. The control unit may perform control so that the injection of the ozone gas into the column in addition to the injection of the reducing gas is continued for a predetermined period of time.

Electron beam exposure apparatus and method for cleaning the same

An image-forming apparatus includes an endless conveyor belt, a counter roller, and a clutch part. The endless conveyor belt is rotatable to convey paper with a surface of the conveyor belt being charged. The counter roller holds the paper between the conveyor belt and the counter roller and conveys the paper. The clutch part is caused to slip by the difference in velocity between the conveyor belt and the counter roller. The counter roller is driven through the clutch part.

Stably operable image-forming apparatus with improved paper conveying and ejecting mechanism

An object of the present invention is to provide an efficient method of manufacturing 3,3',4,4&#x2032;-tetraaminobiphenyl with a smaller number of steps. The manufacturing method of 3,3&#x2032;,4,4&#x2032;-tetraaminobiphenyl includes reacting the amino groups of a 4-halo-o-phenylenediamine with an inorganic sulfur compound to lead to a 5-halo-2,1,3-benzothiadiazole, subsequently coupling two molecules of the benzothiadiazole together to form a 5,5&#x2032;-bis(2,1,3-benzothiadiazole) and then deprotecting the amino groups to yield 3,3&#x2032;,4,4&#x2032;-tetraaminobiphenyl.

Method of manufacturing 3,3',4,4&#x2032;-tetraaminobiphenyl

A method of confirming a certificate by using a management computer that issues the certificate is disclosed. The management computer is coupled to an application terminal for applying for issuance of the certificate and to a confirmation terminal for reading a display code printed on the certificate. The management computer performs the steps of: specifying contents to be certified based on an application item received from the application terminal; issuing the certificate by calculating a compressed value by substituting data related to the contents to be certified into a one-way function, and by generating print data for printing a display code including the compressed value and the contents to be certified; recording an issuance history of the certificate; and when data of a compressed value are received from the confirmation terminal that reads the display code on the certificate, notifying the confirmation terminal of authenticity of the certificate based on a result of comparison between the received compressed value and the compressed value calculated in the step of issuing the certificate.

Certificate confirmation method, certificate confirmation program and certificate that can readily and more positively confirm authenticity of certificate

Growing community of inventors

Kawasaki, Japan

Hiroshi Yasuda