Speedfam Co Ltd

Speedfam-ipec Corporation

Hiroshi Yashiki

Yusuke Inoue

Kouji Ishibashi

Takamitsu Shimoide

Akihiko Yamaya

Katsunori Nagao

Yuusuke Inoue

A polishing system and a method of control of the same enabling reliable transfer of the workpieces into and out of the system while maintaining the precision of polishing of the workpieces. Provision is made of a polishing apparatus 1, a first transfer apparatus 2, a second transfer apparatus 3, and a control apparatus 4. In the polishing apparatus 1, workpieces W held in m number of holding holes 14 formed in n number of carriers 14 are polished on their two surfaces by a lower platen 10 and an upper platen 19. The control apparatus 4 finds the revolution angle of the carriers 14 when the workpieces reach the desired thickness, makes the carriers revolve until the revolution angle of a whole multiple of 360.degree./n closest to the revolution angle found, and then makes the polishing apparatus 1 stop. Further, it finds the rotation angle of the carriers after stopping and makes mounters 24 and 34 of a loader 23 and unloader 33 rotate by exactly that rotation angle so as to transfer the workpieces W into and out from the carriers 14.

Polishing system and method of control of same

A polishing amount control system and method for same which can quickly feed back the results of measurement of a coating layer of a workpiece to the next polishing work so as to improve the productivity of the workpieces and further enable high precision polishing work. The thicknesses of the plating layers of the two surfaces of a magnetic disk W polished by a double-side polishing apparatus 1 are measured by an X-ray thickness meter 2. The rotational speeds of the drive motors 15 and 18 of the double-side polishing apparatus 1 are controlled in accordance with the results of the measurement. Specifically, the polishing amounts of the plating layers of the upper surface and lower surface of the magnetic disk W polished next become within 1.8 .mu.m to 2.2 .mu.m by controlling the rotational speeds of the upper platen 13 and the lower platen 11. The thickness difference of the upper and lower surfaces of the same magnetic disk W become within -0.15 .mu.m to +0.15 .mu.m by controlling the rotational speed of one of the upper platen 13 and lower platen 11.

Polishing amount control system and method for same

A cleaning apparatus enables a workpiece to be rotated at a high speed over a long period, enables the outer and inner circumferences of the workpiece to be cleaned by a simple structure without provision of a special mechanism, and enables avoidance of formation of scratches in the radial direction of the workpiece. Chuck members 1-1 to 1-3 for chucking the outer periphery of a magnetic disk W are driven to rotate by a brush rotation mechanism 4 and are made to rock back and forth in the radial direction of the magnetic disk W by a rocking portion 6 of the brush rotation mechanism 4. Specifically, the rollers 12 of the chuck members 1-1 to 1-3 are formed by polyurethane foam and a plurality of circumferential grooves 14 are formed in the surface of the rollers 12. The rod-shaped brushes 3-1 and 3-2 are formed by attaching sponges 32 having a large number of bumps 30 to the front ends of shafts 31. The rocking portion 6 makes the sponges 32 rock back and forth so that the bumps 30 at the front end swing out to the inner circumference side of the magnetic disk W and the bumps 30 at the rear end swing out to the outer circumference side of the magnetic disk W.

Cleaning apparatus

Both the front and rear surfaces and side of a disc-shaped workpieces W transferred along a transfer path 2 are washed by forward-rotating rollers 15a that contact the workpieces while rotating in a forward direction and backward-rotating rollers 15b that contact the workpieces while rotating in a backward direction, the respective types of rollers being located on the respective sides of the transfer path.

Growing community of inventors

Ayase, Japan

Hiroshi Yashiki