Shibaura Mechatronics Corporation

Hiroshi Wakaba

Yoshinori Hayashi

Hideki Mori

Yoko Ono

Koichi Miyazono

Shozo Kawasaki

Masao Kawamura

A feature analysis apparatus which enables visual confirmation of features of an inspected object and which enables limitations on the degree of freedom of classification based on the features to made relatively smaller is provided. It acquires inspected object information of an inspected object (S), analyzes the inspection information to determine values of feature parameters of each of the plurality of layers (Sto S), uses values of the plurality of feature parameters and their corresponding directions for each of the plurality of layers to generate a single parameter vector (Sto S), converts the parameter vector to a layer vector which is a 3D vector in a predetermined (Sto S), and couples the plurality of layer vectors obtained for the plurality of layers in the order of the layers and generates a set of coordinate values of the plurality of nodes obtained in the 3D space as feature information of the inspected object (S).

Feature analyzing apparatus for a surface of an object

A substrate surface inspection apparatus and method enabling judgment and analysis of the state of even portions of a substrate supported by supports using a captured image are provided. A support mechanismis used where positions of arrangement of substrate support positions along the direction perpendicular to a scan direction by a plurality of first supportstoare set outside the image capturing ranges of the substrateby the imaging unitsat the first relative position and inside the common image capturing range and where positions of arrangement of substrate support positions along the direction perpendicular to the scan direction by the plurality of second supportstoare set outside the image capturing ranges of the substrate by the imaging units at the second relative position and inside the common image capturing range. The surface of the substratesupported by the plurality of first supports is scanned and captured by the imaging units at the first relative position, the imaging units are moved to the second relative position, then the surface of the substratesupported by the plurality of second supports is scanned and captured by the imaging units at the second relative position.

Substrate surface inspecting apparatus and substrate surface inspecting method

A method of inspection and inspection apparatus able to use a captured image to more precisely inspect the state of film, defect parts, etc. at a surface of an object under inspection are provided. A method of inspection and inspection apparatus illuminating a surface of an object under inspectionby white light from an illumination unit Lwhile scanning the surface of the object under inspectionby an image capturing unitto acquire a captured image and using the captured image to inspect a state of the surface of the object under inspection, which changes a state of polarization of light Lstriking the image capturing unitfrom an illuminated location of the object under inspectionand obtains a plurality of captured images based on light of different polarization states LR striking the image capturing unit

Inspection method based on captured image and inspection device

An inspection apparatus to precisely quantitatively inspect positions of formation of film layers formed on the surface of a disk-shaped substrate. It generates captured image data expressing a captured image corresponding to a field of vie based on image signals successively output from an image capturing unit capturing an image of a predetermined surface at an outer circumference part of the disk-shaped substrate and generates film layer edge position information expressing longitudinal direction positions at corresponding positions along the circumferential direction of an edge line of a film layer image pan corresponding to the film layer on the surface image with reference to, from the captured image data, longitudinal direction positions at the different positions along the circumferential direction of a boundary line between a surface image part corresponding to the predetermined surface on the captured image and its outer image part.

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Yokohama, Japan

Hiroshi Wakaba