Gigaphoton Inc.

Nagaoka University of Technology

Hiroshi Umeda

Osamu Wakabayashi

Kouji Kakizaki

Takeshi Asayama

Hakaru Mizoguchi

Hiroaki Tsushima

Hisakazu Katsuumi

Akira Suwa

Weihua Jiang

Takayuki Yabu

Tsukasa Hori

Toshihiro Nishisaka

Takashi Matsunaga

Fumio Iwamoto

Koji Kakizaki

Toshiyuki Hirashita

Takashi Ohara

Kazukiyo Kamikanna

Hiroyuki Ikeda

Tomoyuki Ohkubo

Taku Yamazaki

A high-voltage pulse generation device configured to apply a pulsed high voltage to the space between a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus includes n transformer cores that form a transformer, where n is a natural number greater than or equal to two, n primary electric circuits of the transformer, the n primary electric circuits each having a first terminal connected to a reference potential and a second terminal connected to a charger, the n primary electric circuits each including one or more primary coils, one or more diodes connected in parallel to the one or more primary coils, and one or more pulse generators connected in parallel to the one or more primary coils, and a secondary electric circuit of the transformer, the secondary electric circuit including a secondary coil and connected to the pair of discharge electrodes.

High-voltage pulse generator, gas laser apparatus, and method for manufacturing electronic device

A high voltage pulse generation device includes n transformer cores configuring a transformer, n being a natural number of 2 or more, each of the n transformer cores being configured to form a magnetic circuit along a first plane and to have a width in a first direction parallel to the first plane larger than a width in a second direction parallel to the first plane and perpendicular to the first direction; n primary electric circuits of the transformer connected in parallel to each other, each of the n primary electric circuits including at least one primary coil, and m pulse generation units connected in parallel to the at least one primary coil, m being a natural number equal to or more than 2; and a secondary electric circuit of the transformer including a secondary coil and connected to a pair of discharge electrodes.

High voltage pulse generation device, gas laser apparatus, and electronic device manufacturing method

The laser system includes a first laser apparatus, a second laser apparatus, a charging voltage measuring unit configured to measure the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, at least one bleeding circuit configured to reduce the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, and a bleeding circuit controller configured to control the at least one bleeding circuit based on the voltage measured by the charging voltage measuring unit.

Laser system

The excimer laser device receives data on a target value of pulse energy from an external device and outputs a pulse laser beam. The excimer laser device includes a master oscillator, at least one power amplifier including a chamber provided in an optical path of the pulse laser beam outputted from the master oscillator, a pair of electrodes provided in the chamber, and an electric power source configured to apply voltage to the pair of electrodes, and a controller configured to control the electric power source of one power amplifier of the at least one power amplifier to stop applying the voltage to the pair of electrodes based on the target value of the pulse energy.

Excimer laser device

A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.

Gas laser device and condenser

The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.

An extreme ultraviolet light generation device may include: a chamber earthed to a ground, in which extreme ultraviolet light is generated by irradiating a metal target supplied inside with laser light; a target supply unit earthed to the ground and configured to output the target supplied into the chamber from a nozzle; an extraction electrode configured to exert electrostatic force on the target by applying a negative first potential to the extraction electrode; a first power supply configured to apply the first potential to the extraction electrode; an acceleration electrode unit configured to accelerate the target by applying a negative second potential lower than the first potential to the acceleration electrode unit; a second power supply configured to apply the second potential to the acceleration electrode unit; and a charge neutralizer disposed inside the acceleration electrode unit and configured to emit electrons onto the target.

Extreme ultraviolet light generation device

A laser chamber including a first space and a second space in communication with the first space may include: a first discharge electrode disposed in the first space; a second discharge electrode disposed in the first space to face the first discharge electrode; a fan disposed in the first space and configured to flow laser gas between the first discharge electrode and the second discharge electrode; a peaking condenser disposed in the second space; and an electrical insulating member configured to partition the first space and the second space from one another, and disposed to allow the laser gas to pass through between the first space and the second space.

Laser chamber

In an example of the present invention is an extreme ultraviolet light generation apparatus including: a droplet supply device configured to successively supply droplets; a charging electrode being configured to control charging of droplets supplied from the droplet supply unit; and a target controller configured to control electric polarities of the droplets supplied from the droplet supply unit by controlling potential of the charging electrode in such a way that successive droplets join together to become a target droplet, wherein the droplets controlled in charging by the charging electrode include a plurality of groups each composed of successive droplets, and, in each of the groups, a droplet at one end is charged positively or negatively, a droplet at the other end is uncharged or charged in a polarity being the same as a polarity of an adjacent droplet in a group adjacent to the droplet at the other end.

Extreme ultraviolet light generation apparatus including target droplet joining apparatus

A target supply device may include a tank including a nozzle, a first electrode disposed within the tank, a first potential setting unit configured to set a potential at the first electrode to a first potential, a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential, and a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region.

Target supply device and EUV light generation chamber

A target supply device may include a receptacle for holding a liquid target material, a first electrode disposed within the receptacle, a nozzle portion provided in the receptacle, a second electrode provided with a first path and disposed facing the nozzle portion, a third electrode provided with a second path that, along with the first path, defines a trajectory of the liquid target material released from the nozzle portion, a first power source that applies a first potential that is higher than a common potential to the first electrode, a second power source that applies a second potential that is lower than the common potential to the third electrode, and a third power source that applies a third potential that is no greater than the first potential and is no less than the second potential to the second electrode.

Target supply device and extreme ultraviolet light generation apparatus

A target supply device may include a tank having a nozzle, a first electrode provided with a first through-hole, a second electrode provided with a second through-hole, a third electrode disposed within the tank, an anchoring portion configured to anchor the first electrode and the second electrode to the tank so that insulation among the nozzle, the first electrode, and the second electrode is maintained, and so that a center axis of the nozzle is positioned within the first through-hole and the second through-hole, a first projecting portion that is an integrated part of at least one of the first electrode and the second electrode and that is configured to project toward the nozzle, and a second projecting portion that is an integrated part of at least the second electrode and that is configured to project so as to be positioned between the first electrode and the second electrode.

Target supply device

A target supply device may include a tank including a nozzle, a first electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second electrode that includes a main body portion provided with a second through-hole and a collection portion formed in a cylindrical shape extending in a direction from a circumferential edge of the second through-hole toward the nozzle and that is disposed so that the center axis of the nozzle is positioned within the second through-hole, a third electrode disposed within the tank, and a heating unit configured to heat the second electrode.

A target supply devicemay include a tank, formed of a metal, that holds a target material, an insulating memberthat makes contact with at least part of the periphery of the tank, and a heaterthat is separated from the tankand heats the tankvia the insulating member

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Oyama, Japan

Hiroshi Umeda