Hitachi High-Tech Corporation

Hitachi-High-Technologies Corporation

Hiroshi Touda

Takuma Nishimoto

Isao Furuya

Zihao Ong

Fujio Onishi

Yuki Nakamura

Yuichiro Hashimoto

Masuyuki Sugiyama

Suguru Kondo

Masazumi Tone

Yuki Sugawara

Tetsuji Osawa

A high-voltage module HVMD includes: an error amplifier configured to output a control signal based on a reference signal Vin and a feedback signal; a high voltage output circuit configured to output a high voltage Vout for supply based on the control signal; and a feedback circuit configured to output the feedback signal based on the high voltage Vout for supply. Here, the feedback circuit includes: a first partial circuit configured to receive an input of the high voltage Vout for supply and to output an intermediate signal, the first partial circuit including a resistance element; and a second partial circuit configured to receive an input of the intermediate signal and to output the feedback signal. The high-voltage module HVMD further includes a substrate SUB including: a high voltage substrate region where the high voltage output circuit and a part of the first partial circuit are mounted.

High-voltage module and mass spectrometer using the same

In a mass spectrometer, due to impurities accumulated inside a frame, a withstand voltage may decrease, and electric discharge may occur in an ion source, thereby making it impossible to perform normal measurement. Since a result of abnormality measurement due to the electric discharge cannot be distinguished from measurement abnormality caused by clogging of a tube between a pretreatment unit and a needle, there is a problem in that time is required to identify abnormal portions, and a maintenance property is lowered. As a unit for solving the problem, a return current detection unit connected in series between the frame and an ion source power supply that applies a voltage to the needle and a return current detection unit connected in series between the frame and a counter electrode power supply that applies a voltage to a counter electrode are provided.

Mass spectrometer and mass spectrometry method

The performance of a power supply module is to be improved. The occurrence of discharge in the power supply module is to be prevented, and the size of the power supply module is to be reduced. In a power supply module, substrates are provided being stacked in a planar view. A low voltage circuit and a high voltage circuit are formed on a first substrate such that a distance is kept for preventing surface discharge, and a low voltage circuit is formed on a second substrate. A distance between a component of a high voltage alternating current circuit on the high voltage circuit and a component of the low voltage circuit is three times a shortest distance, at which space discharge does not occurs, between a component that constitutes a high voltage direct current circuit on the high voltage circuit and a component that constitutes the low voltage circuit.

Power supply module and mass spectrometer

A positive high voltage, a first terminal of a semiconductor element, and a first terminal of a first resistance element are connected to a first terminal of a first current controller. A current input terminal of a first active element is connected to a second terminal of the first current controller, and a second terminal of the semiconductor element and a second terminal of the first resistance element are connected to a control terminal of the first active element. A second resistance element is connected between a current output terminal and a control terminal of the first active element. The first current controller allows a drive current corresponding to an input signal to flow in the first active element and allows the drive current output from the first active element to flow into a load, thereby generating an output voltage.

High-voltage amplifier, high-voltage power supply, and mass spectrometer

In a charged particle apparatus with an ion pump, which is a charged particle beam apparatus with an ion pump including a charged particle beam irradiation detecting unit for irradiating a sample with a charged particle beam in a chamber and detecting a secondary charged particle, an image processing unit for forming a secondary charged particle image from a detection signal of the detected secondary charged particle, an output unit for processing at the image processing unit and outputting an image, an ion pump for maintaining the interior of the processing chamber in a vacuum state, a driving power supply unit of the ion pump, and a high voltage cable for connecting the ion pump and the driving power supply unit, the driving power supply unit of the ion pump is structured to include a high voltage power supply circuit unit for operating the ion pump, a load current detection circuit unit for detecting a load current applied to the ion pump, and a canceller circuit unit for reducing low frequency noise applied to the load current detection circuit unit in order to sufficiently reduce low frequency noise of the power supply of the ion and to measure the degree of vacuum with a high accuracy.

Charged particle beam device provided with ion pump

A light signal detecting circuit, a light amount detecting device, and a charged-particle-beam device capable of discriminating the signal component of a small amount of light from the signal component of noise due to dark current. A data-processing-unit detects pulses from digital voltage signal corresponding to an amount of light obtained by an amplifier and an A-D converter, calculates a crest value as the maximum voltage value of each pulse, and stores the occurrence frequency of each calculated crest value in a frequency occurrence storage area. A data analysis unit compares a previously-determined frequency lower limit with the occurrence frequency of each crest value in ascending order of the crest values and sets a pulse determination threshold to the first crest value whose occurrence frequency is equal to or smaller than the frequency lower limit. The threshold processing unit thus outputs the digital signal higher than the pulse determination threshold.

Growing community of inventors

Tokyo, Japan

Hiroshi Touda