Hitachi, Ltd.

Hitachi Instrument Engineering Co., Ltd.

Hitachi Instrument Eng. Co.

Hiroshi Toita

Hifumi Tamura

Hiroshi Iwamoto

Hiroshi Hirose

Issei Tobita

A secondary ion mass analyzing apparatus is suitable for a depth directional analysis of a specimen. The apparatus includes means for forming an image of said secondary ions, an aperture disposed on a position in which the secondary ion image is formed, means for detecting the secondary ions which have passed through the aperture and for converting the detected ions into electrical signals, and means for displaying an image of said aperture based on the electrical signals. In such a manner, the aperture is disposed on the secondary ion image forming position. The image of the aperture is displayed on the image displaying apparatus by using the secondary ions which have passed through the aperture. If the ion image is not formed on the position of the aperture, the contour of the aperture image would be unclear while if the ion image is formed on the position of the aperture, the contour of the aperture image would be clear. Accordingly, by monitoring the clearness of the aperture image, focusing of the ion image upon the aperture position may be determined. Therefore, the secondary ions which have generated from the specimen corresponding to a portion other than the central portion of the primary ion beam can be prevented from being introduced to a mass analyzing portion. A depth directional analysis of the specimen can be accomplished at a high accuracy.

Secondary ion mass analyzing apparatus

A composite apparatus is disclosed which includes in combination a secondary ion mass spectrometry instrument and a scanning electron microscope. A liquid metal ion source and an ion source other than the liquid metal ion source are installed in the same apparatus so that an ion beam emitted from the liquid metal ion source and an ion beam emitted from the ion source other than the liquid metal ion source are aligned with each other on a primary beam axis which is an optical axis of an irradiating system. The liquid metal ion source is disposed in rear of a primary ion separating device which mass-separates the ion beam emitted from the ion source other than the liquid metal ion source. Further, an electron gun is installed in the same apparatus so that an electron beam emitted from the electron gun is aligned with the ion beam on the primary beam axis.

Composite apparatus with secondary ion mass spectrometry instrument and

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Katsuta, Japan

Hiroshi Toita