Tokyo Electron Limited

Sony Corporation

Fuji Photo Film Company, Limited

Nissan Motor Company Limited

Tokyo Electron Saga Limited

Tokyo Electron Kyushu Limited

Sony Group Corporation

Chugai Seiyaku Kabushiki Kaisha

Nippon Telegraph and Telephone Corporation

Joled Inc.

Hiroshi Tanaka

Kazuya Hayashibe

Yuji Kamikawa

Yuuji Kamikawa

Itaru Oshiyama

Noriyuki Anai

Takami Satoh

Teruomi Minami

Koji Harada

Teppei Imamura

Takayuki Tomoeda

Fumihiro Kamimura

Hirofumi Shiraishi

Shinya Murakami

Sinichiro Izumi

Junichi Hasegawa

Ken Nakayama

Koukichi Hiroshiro

Shinichiro Shimomura

Akihiro Sakakida

Shunichi Kajiya

Takeshi Murata

Yoshihiro Seto

Hiroshi Tazawa

Yasuhisa Takeuchi

Kazuhito Hori

Hironobu Hyakutake

Takao Inada

Yosuke Kawabuchi

Shori Mokuo

Mitsuo Nishi

Kotaro Tsurusaki

Kenji Yokomizo

Satoshi Niizuma

Tsukasa Hirayama

Kihito Hada

Hatsuo Kawada

Yoshihiro Nishiyama

Hideaki Shimada

Rie Tsubo

Sousuke Hara

Toru Yatabe

Nobuyoshi Nakajima

Hiroshi Inoue

Isao Yamamoto

Takayuki Toshima

Hisatoyo Kato

Naoki Shindo

Yoshiya Hagimoto

Norihiro Ito

Kenji Sekiguchi

Jian Chen

Takeshi Funahashi

Hayato Iwamoto

Keita Ishikawa

Hiroyuki Nomura

Satoshi Okano

Yoshinori Nakano

Shigenori Kitahara

Yuuma Adachi

Yoshiyuki Etoh

Kinichiro Nakano

Kazuhiro Kageyama

Kunimasa Shimizu

Yukitsugu Hirota

Kazuyuki Mori

Shigemitsu Mizutani

Masao Shigyo

Satoshi Nakashima

Takanori Miyazaki

Kiyoshi Yoshida

Takashi Terada

Masanari Yamaguchi

Kazuki Kosai

Eiichi Asai

Kazuyoshi Eshima

Yasushi Fujii

Takashi Yabuta

Hiroki Sakurai

Nobuaki Higashi

Hirotaka Maruyama

Hisashi Niioka

Yoshito Nakanishi

Yasuhiro Chouno

Toshiyuki Shiokawa

Kiyoshi Kobayashi

Takashi Uno

Kotaro Akashi

Manaf Hasan

Eiichi Mukai

Toshiyuki Mio

Hiroshi Kazama

Hidetoshi Nakao

Kunihiko Saruta

Takayoshi Nabeta

Nobuo Sakatsume

Douglas Vanderwees

Mark Britton

Craig Hogg

Atushi Yamashita

The present technology relates to a solid state imaging sensor that is possible to suppress the reflection of incident light with a wide wavelength band. A reflectance adjusting layer is provided on the substrate in an incident direction of the incident light with respect to the substrate such as Si and configured to adjust reflection of the incident light on the substrate. The reflectance adjusting layer includes a first layer formed on the substrate and a second layer formed on the first layer. The first layer includes a concavo-convex structure provided on the substrate and a material which is filled into a concave portion of the concavo-convex structure and has a refractive index lower than that of the substrate, and the second layer includes a material having a refractive index lower than that of the first layer. It is possible to reduce the reflection on the substrate such as Si by using the principle of the interference of the thin film. Such a technology can be applied to solid state imaging sensors.

Solid-state imaging sensor

A substrate liquid processing apparatus includes a liquid processing unit, a processing liquid circulating line, and a boiling state detecting unit provided in a processing bath of the liquid processing unit. The controller controls a supply pump of the processing liquid circulating line based on a signal from the boiling state detecting unit, and adjusts a pressure of a supplied phosphoric acid aqueous solution in a flow path so as to adjust the boiling state of the phosphoric acid aqueous solution to a desired state.

Substrate liquid processing apparatus, substrate liquid processing method, and storage medium

A transfer mold includes a body, a first layer, and a second layer. The body has a projecting-and-recessed surface. The first layer contains an inorganic material and is disposed on the projecting-and-recessed surface of the body. The second layer contains fluorine and is disposed on a surface of the first layer. The average of hardness values of the projecting-and-recessed surface on which the first and second layers are disposed is 30 Hv or higher.

Transfer mold and manufacturing method for structure

An optical unit having an antireflection function includes a wave surface having a wavelength equal to or shorter than a wavelength of visible light. The wave surface has a curved plane which curves in a recessed shape between an apex portion and a bottom portion of the wave surface. An inflection point of an area of a cross section obtained by cutting through the wave surface in a plane perpendicular to a direction of vibration of the wave surface is positioned toward the bottom portion of the wave surface from a center of the vibration.

Optical unit, imaging device, electronic apparatus, and master

The present invention relates to benzamide derivatives represented by formula (I) or pharmaceutically acceptable salts thereof. 

Benzamide derivative

The present invention relates to quinazolinedione derivatives represented by formula (I) or pharmaceutically acceptable salts thereof. 

Quinazolinedione derivative

The present invention provides a chemical-liquid mixing method and a chemical-liquid mixing apparatus capable of sufficiently generating a peroxomonosulfuric acid that is effective in removing a resist from a substrate, when a sulfuric acid and a hydrogen peroxide solution are mixed with each other. At first, an inner tankis filled up with a sulfuric acid and the sulfuric acid overflowing from the inner tankis allowed to flow into an outer tank. Then, a hydrogen peroxide solution is supplied into the inner tankand the hydrogen peroxide solution is allowed to flow into the outer tankwhereby the two kinds of liquids of the hydrogen peroxide solution and the sulfuric acid are stored in the outer tank. Simultaneously when the hydrogen peroxide solution flows into the outer tank, a return pumpis activated.

Chemical-liquid mixing method and chemical-liquid mixing apparatus

A wafer is held horizontally and rotated by a substrate holding mechanism. An aqueous alkaline solution is supplied to a wafer by a nozzle and caused to flow from a central portion to a peripheral edge portion of the wafer, thereby etching the wafer. An amount of oxygen, which is equal to or more than the amount of oxygen in atmospheric air involved in the aqueous alkaline solution flowing on the wafer, is previously dissolved in the aqueous alkaline solution.

Substrate processing method, substrate processing apparatus, and storage medium

The present invention provides a chemical-liquid mixing method and a chemical-liquid mixing apparatus capable of sufficiently generating a peroxornonosulfuric acid that is effective in removing a resist from a substrate, when a sulfuric acid and a hydrogen peroxide solution are mixed with each other. At first, an inner tankis filled up with a sulfuric acid and the sulfuric acid overflowing from the inner tankis allowed to flow into an outer tank. Then, a hydrogen peroxide solution is supplied into the inner tankand the hydrogen peroxide solution is allowed to flow into the outer tankwhereby the two kinds of liquids of the hydrogen peroxide solution and the sulfuric acid are stored in the outer tank. Simultaneously when the hydrogen peroxide solution flows into the outer tank, a return pumpis activated.

Disclosed herein is an image display apparatus, including: a light source; and a scanning section adapted to scan a light beam emitted from the light source; the scanning section including (a) a first mirror, (b) a first light deflection section, (c) a second mirror, and (d) a second light deflection section; the second light deflection section including an external light receiving face; the second light deflection section having a plurality of translucent films provided in the inside thereof; the translucent films having a light reflectivity Rat a wavelength of the light beam which satisfies: R&#x2266;k&#xd7;{(P/t)&#xd7;tan(&#x3b6;)}where k is a constant higher 0 but lower than 1, Pan array pitch of the translucent films, ta thickness of the second light deflection section, and &#x3b6;an angle formed between the light emitting face and the translucent films.

Optical device, image display apparatus and head-mounted display unit

A method of manufacturing a display not needing a complicated post-process for forming a reflecting mirror film and allowing degradation in an organic light-emitting device to be prevented, and a display. The method of manufacturing a display includes the steps of: forming a plurality of organic light-emitting devices in a display region on a substrate to form a light-emitting panel; forming projection-shaped reflection elements corresponding to the plurality of organic light-emitting devices, respectively, on a base to form a reflector; forming an adhesive layer along an outer edge of the light-emitting panel; and bonding the light-emitting panel and the reflector together with the adhesive layer in a vacuum atmosphere, thereby to form a vacuum layer in a space between the light-emitting panel and the reflector.

Method of manufacturing display, and display

Growing community of inventors

Kurume, Japan

Hiroshi Tanaka