Gigaphoton Inc.

Komatsu Corporation

Hiroshi Someya

Tamotsu Abe

Takashi Suganuma

Osamu Wakabayashi

Yukio Watanabe

Akira Sumitani

Masato Moriya

Takayuki Yabu

Hideo Hoshino

Toshihiro Nishisaka

Takeshi Asayama

Katsuhiko Wakana

Hakaru Mizoguchi

Tsukasa Hori

Takanobu Ishihara

Yutaka Shiraishi

Takuya Ishii

Hideto Saito

Yuki Kawashima

Yuto Tanaka

Hisashi Nara

An optical apparatus may include a housing having an opened front face, an optical unit freely movable into and out of an internal space of the housing through the front face, and a positioning portion disposed on a back side of the optical unit in the internal space. A base plate of the optical unit may include first and second convex portions disposed on a base end face of the base plate. The second convex portion may be disposed at a position different from the first convex portion in a width direction of the base plate. The positioning portion may include a V block having a V groove shape at a part contacting the first convex portion, and a flat block having a flat surface shape at a part contacting the second convex portion. The optical unit may be positioned in the internal space through the contact.

Optical apparatus

A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.

Target supply device, target supply method, and electronic device manufacturing method

An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes a mirror configured to reflect extreme ultraviolet light, a filter configured to transmit the extreme ultraviolet light reflected by the mirror, an optical sensor configured to detect the extreme ultraviolet light having passed through the filter, a purge gas supply unit disposed to supply purge gas to a space between the mirror and the filter, and a pipe part configured to allow plasma light including the extreme ultraviolet light entering from an opening to pass therethrough toward the mirror and allow the purge gas flowing to the space between the mirror and the filter to flow out of the opening.

Extreme ultraviolet light sensor unit and extreme ultraviolet light generation device

An optical unit and an optical path tube are easily connected. A structure of connection between a side surface () of the optical unit and the optical path tube includes: an extensible tube () constituting at least a part of the optical path tube, the extensible tube being extensible in a tube axis direction; a flange () attached to one end of the optical path tube; a flange receiving part () provided on the optical unit, the flange receiving part () receiving a front surface () of the flange (), the front surface () of the flange () being an end surface on an open side; and a biasing part () configured to bias at least a part of the optical path tube in a direction in which the extensible tube () extends.

Structure of connection between optical unit and optical path tube

A gas lock device may include a chamber having a passage section and a connection hole that connects a surface to the passage section, an optical element that is attached to the chamber and seals the passage section, a gas supply apparatus, and a pipe that is attached at one end to the gas supply apparatus and attached at the other end to the chamber, and may define a flow channel communicating with the connection hole.

Gas lock device and extreme ultraviolet light generation apparatus

A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.

Target supply device

A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

Mirror device

A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.

Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus

A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.

A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

Method and apparatus for cleaning collector mirror in EUV light generator

A collector mirror exchanging apparatus is capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.

An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.

Extreme ultraviolet light source apparatus

A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.

Extreme ultraviolet light source apparatus and target supply device

An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

Growing community of inventors

Hiratsuka, Japan

Hiroshi Someya