Semiconductor Energy Laboratory Co., Ltd.

Fujifilm Corporation

Ricoh Company, Ltd.

Fuji Xerox Co., Ltd.

Vlsi Technology Research Association

Fujitsu Corporation

Sharp Kabushiki Kaisha Corporation

Matsushita Ecology Systems Co., Ltd.

Ulsi Technology Research Association

Hiroshi Shibata

Shunpei Yamazaki

Atsuo Isobe

Masahiko Hayakawa

Tatsuya Arao

Chiho Kokubo

Koichiro Tanaka

Hidekazu Miyairi

Mai Akiba

Jun Koyama

Akihisa Shimomura

Koji Dairiki

Takeshi Fukunaga

Shinji Maekawa

Masaki Kataoka

Toru Takayama

Yasuyuki Arai

Hiroki Adachi

Taketomi Asami

Ritsuko Kawasaki

Naoya Sakamoto

Yoshifumi Tanada

Takayuki Ikeda

Yu Yamazaki

Munehiro Azami

Hidehito Kitakado

Aiko Shiga

Tetsuzo Kadomatsu

Atsushi Murakami

Masaaki Hiroki

Kenji Kasahara

Jun Isozaki

Masahito Katada

Yoshihira Rai

Tatsuya Enomoto

Hisashi Ohtani

Akiharu Miyanaga

Osamu Nakamura

Yukio Tanaka

Akira Ishikawa

Toru Mitsuki

Koji Furukawa

Akira Wakabayashi

Hideo Iwasaki

Tohru Ueda

Takeshi Shichi

Fumihiro Ogasawara

Kumiko Tanaka

Hiroyuki Egawa

Yasuyo Yokota

Hitoshi Kosokabe

Toshifumi Shobu

Yuko Katada, Legal Representative

Shunichi Naka

Masayuki Shimizu

Kousuke Yunoki

Akira Takakusagi

Atsugo Isobe

Takuya Murayama

Kazuyoshi Takayama

Teruaki Ichikawa

Kunio Yamada

A semiconductor device production system using a laser crystallization method is provided which can avoid forming grain boundaries in a channel formation region of a TFT, thereby preventing grain boundaries from lowering the mobility of the TFT greatly, from lowering ON current, and from increasing OFF current. Rectangular or stripe pattern depression and projection portions are formed on an insulating film. A semiconductor film is formed on the insulating film. The semiconductor film is irradiated with continuous wave laser light by running the laser light along the stripe pattern depression and projection portions of the insulating film or along the major or minor axis direction of the rectangle. Although continuous wave laser light is most preferred among laser light, it is also possible to use pulse oscillation laser light in irradiating the semiconductor film.

Semiconductor device and semiconductor device production system

A semiconductor device production system using a laser crystallization method is provided which can avoid forming grain boundaries in a channel formulation region of a TFT, thereby preventing grain boundaries from lowering the mobility of the TFT greatly, from lowering ON current, and from increasing OFF current. Rectangular or stripe pattern depression and projection portions are formed on an insulating film. A semiconductor film is formed on the insulating film. The semiconductor film is irradiated with continuous wave laser light by running the laser light along the stripe pattern depression and projection portions of the insulating film or along the major or minor axis direction of the rectangle. Although continuous wave laser light is most preferred among laser light, it is also possible to use pulse oscillation laser light in irradiating the semiconductor film.

To provide a liquid crystal display device having high quality display by obtaining a high aperture ratio while securing a sufficient storage capacitor (Cs), and at the same time, by dispersing a load (a pixel writing-in electric current) of a capacitor wiring in a timely manner to effectively reduce the load. A scanning line is formed on a different layer from a gate electrode and the capacitor wiring is arranged so as to be parallel with a signal line. Each pixel is connected to the individually independent capacitor wiring via a dielectric. Therefore, variations in the electric potential of the capacitor wiring caused by a writing-in electric current of a neighboring pixel can be avoided, whereby obtaining satisfactory display images.

Display device comprising a thin film transistor and a storage capacitor

An inkjet recording device includes: a head; an ink tank which is connected with the head through a supply channel and a collection channel; a deaeration module which is provided on a side of the supply channel; a main tank; and a supply control unit which controls supply and collection of the ink, where: a supplement flow rate from the main tank to the ink tank is assumed as L1 (ml/sec), a consumption flow rate of ejection from the head is assumed as L2 (ml/sec), and, in the case of L1&#x3c;L2, print time limit n is calculated by equation: n&#x2266;(&#x394;T/L2)+[T/(L2&#x2212;L1)]; and, when printing does not end within the print time limit n, the printing is interrupted and the ink is deaerated by circulating the ink.

Inkjet recording device

A multi-gate structure is used and a width (d) of a high concentration impurity region sandwiched by two channel forming regions in a channel length direction is set to be shorter than a width (d) of low concentration impurity regions in the channel length direction. Thus, a resistance of the entire semiconductor layer of a TFT which is in an on state is reduced to increase an on current. In addition, a carrier life time due to photoexcitation produced in the high concentration impurity region can be shortened to reduce light sensitivity.

Semiconductor device, manufacturing method thereof, and display device

Liquid crystal display device including light shielding film

A multi-gate structure is used and a width (d1) of a high concentration impurity region sandwiched by two channel forming regions in a channel length direction is set to be shorter than a width (d2) of low concentration impurity regions in the channel length direction. Thus, a resistance of the entire semiconductor layer of a TFT which is in an on state is reduced to increase an on current. In addition, a carrier life time due to photoexcitation produced in the high concentration impurity region can be shortened to reduce light sensitivity.

The present invention provides a liquid droplet ejecting apparatus that may cool, with a simple configuration, drive sections of piezoelectric elements. Namely, the liquid droplet ejecting apparatus has head modules that use piezoelectric elements to eject ink droplets, driver ICs that drive the piezoelectric elements, a ventilation unit that delivers dry air to the environs of the piezoelectric elements via a gas delivery passage disposed therein in order to dehumidify the environs of the piezoelectric elements, a branch tube that branches from the gas delivery passage and blows onto the driver ICs some of the air that has been delivered, and a duckbill valve that is disposed in the branch tube. Here, the ventilation unit that delivers the dry air in order to dehumidify the environs of the piezoelectric elements also cools the driver ICs, so the driver ICs can be cooled with a simple configuration.

Liquid droplet ejecting apparatus

A maintenance method of a droplet ejection apparatus is provided, which droplet ejection apparatus includes: a droplet ejection head including a plurality of head modules, each head module being configured to be replaced independently; and a liquid circulation and supply unit configured to circulate and supply liquid to be ejected from each head module, to each head module. The maintenance method includes circulating and supplying the liquid to the head modules other than the head module that is a replacement target, when replacing the head module.

Droplet ejection apparatus and maintenance method thereof

Display device comprising pixel

A pressure buffering unit is reduced in size, and thereby the effect of a flexible membrane is suppressed while the performance of the pressure buffering unit is maintained. A liquid supply device includes: a liquid supply passage which communicates with a recording head in which a plurality of nozzles are arranged; a liquid pressure applying part provided in the liquid supply passage that applies a predetermined pressure to liquid; and a pressure buffering unit provided en route in the liquid supply passage and being configured to include a liquid chamber having a supply port and a discharge port through which the liquid flowing through the liquid supply passage flows in and out, a gas chamber provided to oppose the liquid chamber, and a flexible membrane interposed therebetween, wherein the flexible membrane is provided with initial bending in advance.

Liquid supply device, liquid discharge device, and image recording apparatus having pressure buffering unit

A liquid ejection apparatus includes: a gas chamber surrounding a piezoelectric element in an inkjet head; and a dry gas supply device configured to start supply of dry gas to the gas chamber before supply of electric power to the inkjet head is started, to continue the supply of the dry gas while the supply of the electric power to the inkjet head is continued, and to halt the supply of the dry gas after the supply of the electric power to the inkjet head is halted. While the dry gas supply device halts the supply of the dry gas to the gas chamber, a dry gas supply flow channel opening and closing device is closed to disconnect the dry gas supply device and the gas chamber, and a gas return flow channel opening and closing device is closed to disconnect the gas chamber and the external air.

Liquid ejection apparatus and drive method for inkjet head

Growing community of inventors

Kanagawa, Japan

Hiroshi Shibata