Canon Kabushiki Kaisha

Honda Motor Co., Ltd.

Honda Giken Kogyo Kabushiki Kaisha

Ts Tech Co., Ltd.

Hoya Corporation

Keihin Corporation

Dai-ichi Kogyo Seiyaku Co., Ltd.

Takii Shubyo Kabushiki Kaisha

T.s. Plant Science Institute Co., Ltd.

Mitsuba Corporation

Hiroshi Sato

Hidekazu Shimomura

Keiichiro Ishihara

Manabu Kato

Naoto Sen

Yasushi Shimizu

Katsumi Nakagawa

Hideki Ina

Shunichi Ishihara

Nobuyoshi Takehara

Shoji Nishida

Kimitoshi Fukae

Hiromitsu Hirabayashi

Masami Ikeda

Noribumi Koitabashi

Toshio Kashino

Tsutomu Abe

Hitoshi Sugimoto

Shinichi Sato

Sadayuki Sugama

Shigeyasu Nagoshi

Eiichiro Shimizu

Masahiko Higuma

Yuji Akiyama

Masahiro Yoshida

Hiroki Tajima

Masaya Uetsuki

Masaki Ueno

Kazuhiko Mishima

Toshiaki Arai

Satoru Kudo

Tomohiko Yamamoto

Yasuhisa Nagayama

Seiichi Shinohara

Tadayoshi Okada

Tokuji Takizawa

Ken Tanimura

Hiroshi Morohoshi

Syuhei Kawasaki

Yasuhiko Tomokuni

Akira Ito

Hideaki Kotani

Fumihiro Gotoh

Takeshi Okazaki

Miyuki Fujita

Yukiko Iwasaki

Masaaki Iwane

Yasuyoshi Takai

Masanobu Saito

Hirohiko Shinonaga

Takehito Yoshino

Junichi Kato

Kojiro Yasui

Hironobu Isobe

Fumiharu Ochiai

Kazushige Sakurai

Yasufumi Yoshino

Naohito Asai

Hayato Kikuchi

Yukio Takabayashi

Noritaka Ukiyo

Masaki Mizutani

Koichi Suwa

Kazumi Yamauchi

Kazuhiro Sato

Takanori Uemura

Mitsuru Hiura

Atsushi Kusaka

Gaku Konishi

Keita Ishizaka

Chie Hatakeyama

Akira Sugiyama

Rikiya Oyama

Kenichi Nishida

Hideo Nakahama

Satoshi Iino

Tomohiro Tsutsumi

Takeo Tsujimoto

Norio Kubota

Katsuyori Yamaguchi

Hiroyuki Ohba

Shinya Matsushita

Shinichiro Horisoko

Atsushi Miyaki

Kiyoshi Hashimoto

Provided is an imprinting method suitable for positioning. The imprinting method includes: supplying an imprint material onto a substrate; bringing a patterned portion of a mold into contact with the imprint material, which has been supplied onto the substrate in the supplying of the imprint material, to form a pattern on the imprint material in a predetermined pattern region on the substrate; and increasing viscosity of the imprint material at a predetermined position, which includes a position of a predetermined mark provided on the substrate, other than the pattern region to be higher than viscosity of the imprint material in the pattern region after the supplying of the imprint material and before the bringing of the patterned portion into contact with the imprint material.

Imprinting method, pre-processing apparatus, substrate for imprinting, and method for manufacturing substrate

Provided is an imprint method of performing an imprint process including a contacting step of bringing a mold into contact with an imprint material on a substrate, a curing step of curing the imprint material, and a separating step of separating the mold from the cured imprint material. The method includes acquiring global alignment information, performing a pre-alignment measurement including moving, based on the acquired global alignment information, a second shot region to a measurement position at which a measurement device performs measurement, and measuring a first relative positional shift between the second shot region and the mold using the measurement device, and moving, based on the global alignment information and the measured first relative positional shift, a first shot region to an imprint position at which the imprint process is performed, and starting the contacting step.

Imprint method, imprint apparatus, and article manufacturing method

The present invention provides an imprint apparatus for forming a pattern in an imprint material on a substrate using an original, comprising: an image capturing unit configured to capture an image of the substrate; and a processor configured to perform, based on fine-detection marks and rough-detection marks in the image obtained by the image capturing unit, an alignment process of the original and the substrate in forming the pattern in the imprint material, and overlay inspection of the substrate and the pattern formed in the imprint material, wherein the processor is configured to change, between the alignment process and the overlay inspection, a rough-detection mark group to be used to specify positions of fine-detection marks in the image obtained by the image capturing unit.

Imprint apparatus and method of manufacturing article

An imprint apparatus is operable to perform an imprint process, which is for forming a pattern on an imprint material on a substrate by using a mold, for each of shot regions of the substrate. The apparatus includes a controller configured to control alignment between the mold and the substrate. The controller determines a target position obtained by adding a predetermined additional amount to a movement amount of a substrate stage according to a positional deviation between the mold and the substrate, starts movement of the stage towards the determined target position, and starts curing of the imprint material by a curing device at a timing at which the detected positional deviation falls within an allowable range during the movement of the stage.

Imprint apparatus and article manufacturing method

A pattern forming method includes: a first step of forming a first pattern to define a first shot arrangement; and a second step of performing an imprint process, thereby forming a second pattern on the imprint material on the first pattern and defining a second shot arrangement. In the second step, the second shot arrangement is defined so as to reduce an overlay error between the first and second shot arrangements by deforming the mold. In the first step, based on information of the estimated second shot arrangement definable on the substrate when the second step is performed after the second pattern formed on the mold is amended by deforming the mold, the first pattern is formed to make an overlay error between the first and second shot arrangements fall within an allowable range.

Pattern formation method, lithography apparatus, lithography system, and article manufacturing method

The present invention provides an imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold, the apparatus including a control unit configured to control a driving unit and a deformation unit such that parts of position control of controlling the relative positions of the mold and the substrate, and shape control of deforming at least one of the mold and the substrate are performed concurrently, wherein the control unit includes an input unit configured to give, to target position data, time-series data representing relative positions of the mold and the substrate that change at each time during which the shape control is performed in accordance with deformation in at least one of the mold and the substrate by the deformation unit.

A method for forming a pattern of an imprint material on a shot region of a substrate by using a mold, includes determining a plurality of marks for alignment of the shot region and the mold, performing measurement for the alignment using the plurality of marks determined in the determining, setting an origin position of a coordinate system for acquisition of an alignment error between the shot region and the mold based on an arrangement of the plurality of marks determined in the determining, and acquiring the alignment error based on a measurement result in the measurement and the origin position determined in the setting.

Method and apparatus for forming pattern on imprint material

The present invention provides a position detection apparatus including a detection unit configured to detect moire caused by overlap between a first diffraction grating including patterns arrayed in a first direction and a second diffraction grating including patterns arrayed in the first direction, and a processing unit configured to obtain a relative position of the first diffraction grating and the second diffraction grating based on the moire, wherein a width of an end pattern of patterns included in at least one of the first diffraction grating and the second diffraction grating in the first direction is smaller than widths of remaining patterns of the at least one diffraction grating in the first direction.

Position detection apparatus, position detection method, imprint apparatus, and method of manufacturing article

A position detection device for adjusting positions of a mold and a substrate using a mold mark formed on the mold and a substrate mark formed on the substrate includes a detection unit configured to detect light from the mold mark and the substrate mark, and a processing unit configured to obtain a positional relationship between the substrate and the mold based on a detection result of the detection unit, wherein the processing unit obtains the positional relationship between the substrate and the mold based on a corrected signal obtained by removing a noise component based on the light from the mold mark from a detected signal based on the light from the mold mark and the substrate mark.

Position detection device, position detection method, imprint apparatus, and method for manufacturing article

An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a plurality of alignment scopes and a control unit. The control unit controls aligning of a shot region of the substrate and the mold based on outputs from the plurality of alignment scopes. Each of the plurality of alignment scopes outputs information indicating a relative position of a first mark selected from a plurality of first marks in the shot region and a second mark selected from a plurality of second marks on the mold. The control unit controls aligning of the shot region and the mold based on information excluding incorrect information from a plurality of pieces of information output from the plurality of alignment scopes.

Imprint apparatus and method for producing article

The present invention provides an imprint apparatus which performs an imprint process for forming a pattern on an imprint material on a substrate using a mold, the apparatus including an obtaining unit configured to obtain each shape of a plurality of shot regions on the substrate before the mold and the shot region as an imprint target on the substrate face each other, a first correction unit configured to correct, for each shot region on the substrate, a shape difference between a pattern of the mold and the shot region, a measurement unit configured to measure a displacement between the pattern of the mold and the shot region on the substrate, a second correction unit configured to correct the displacement, and a control unit configured to control the imprint process.

Imprint apparatus, imprint system, and method of manufacturing article

This disclosure provides an imprint apparatus configured to form a pattern with an imprint material by bringing the imprint material on a substrate and a pattern of the mold into contact with each other including a drive unit to bring part of the pattern of the mold into contact with the imprint material, and bring the pattern into contact with the imprint material so a contact surface area between the pattern of the mold and the imprint material increases, an interference fringe detecting unit to detect an interference fringe generated by reflected light from the pattern of the mold and reflected light from the substrate, and a state detecting unit to detect a contact state between the pattern of the mold and the imprint material on the basis of the interference fringe.

Imprint apparatus, imprint method, detecting method, and method of manufacturing device

The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on a substrate by molding an imprint material on the substrate using a mold, the apparatus including a measurement unit configured to measure relative positions of the mold and the substrate, a light source unit configured to emit light for curing the imprint material, a scanning unit configured to scan light from the light source unit on the substrate, and a control unit configured to control the imprint process, wherein the control unit performs the imprint process by causing the scanning unit to scan the light while partially aligning the mold and the substrate with each other based on a measurement result of the measurement unit.

Arrangement information regarding shot areas is obtained in an imprinting method. When a pattern is sequentially formed in the shot areas, the attraction force of a first attraction area is reduced to less than that of the second attraction area. After the pattern is formed in the shot area corresponding to the first attraction area, the attraction forces of the first and second attraction areas are changed. The position information regarding the shot area corresponding to the second attraction area is obtained, which is compared with the position information regarding the shot area corresponding to the second attraction area based on the arrangement information. If the difference between the compared position information is a threshold value or less, positioning of a substrate and a mold is achieved using the arrangement information. If the difference is greater than the threshold value, the arrangement information regarding the shot areas is obtained again.

Imprinting method, imprinting apparatus, and device manufacturing method

Growing community of inventors

Utsunomiya, Japan

Hiroshi Sato