Panasonic Intellectual Property Management Co., Ltd.

Hiroshi Sakaue

Masaru Sasago

Akio Misaka

Shigeo Irie

Yoshimasa Yoshioka

An opening width of a main pattern is a width with which a transcription pattern is formed on a target member to be exposed by transmitted exposure light, and is a dimension of 0.8&#xd7;(&#x3bb;/NA)&#xd7;M or less (where &#x3bb; is a wavelength of the exposure light, and NA and M are a numerical aperture and a reduction ratio of a reduced projection optical system of an exposure apparatus). Each of a first auxiliary pattern adjacent to the main pattern and a second auxiliary pattern located outside the first auxiliary pattern to be adjacent thereto has a width with which a transcription pattern is not formed by the exposure light and generates diffracted light. A first distance between respective centers of the main pattern and the first auxiliary pattern is greater than a second distance between respective centers of the first auxiliary pattern and the second auxiliary pattern.

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Kanagawa, Japan

Hiroshi Sakaue