Fujitsu Corporation

Fujitsu Semiconductor Limited

Fujitsu Vlsi Limited

Asahi Techno Glass Corporation

Hiroshi Osuda

Masataka Fukuizumi

Toru Matoba

Naoki Hiraoka

Hotaka Yamamoto

Daisuke Adachi

Takayuki Sadakata

Kiyohito Koizumi

Takeshi Nakamura

An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.

Chemical solution feeding apparatus and method for preparing slurry

A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid. The liquid level and physical state of the waste liquid in both the concentrating column and the purifying column are monitored to insure that only an optimum amount of waste liquid for distillation is stored in each of the columns.

Apparatus and method for distilling waste liquids

A supply apparatus for preparing a mixed chemical solution of a predetermined mixing ratio at a low cost and for supplying the mixed chemical solution stably. The supply apparatus includes a measuring apparatus located on an intermediate portion of a flow channel through which the chemical solution flows upward for measuring properties of the mixed chemical solution. In the lower portion of the measuring apparatus, disposed is a nozzle for spouting the chemical solution upward.

Apparatus for measuring characteristics of chemical solution, chemical solution supply apparatus, and method for measuring concentration of chemical solution

A chemical solution preparation apparatus for preparing a chemical solution from chemical gas of an industrial chemical grade. A dissolution unit dissolves the chemical gas in pure water, which is contained in a tank. A gas discharge control unit controls the amount of chemical gas discharged from the dissolution unit. A liquid discharge discharges a predetermined amount of the chemical solution from the tank. At least one of the gas discharge control unit and the liquid discharge control unit are operated at substantially the same time as the dissolution unit.

Method and apparatus for preparing chemical solutions

An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized circulation. The slurry effluent is then regenerated and reused.

Method and apparatus for reuse of abrasive fluid used in the manufacture of semiconductors

A heating vessel for concentration is formed in an elongated one, and a baffle plate is arranged to increase sulfuric acid liquid concentration at an outlet to a high level. The heating vessel for concentration and a heating vessel for distillation are installed so that the respective heating vessels have substantially the same waste sulfuric acid liquid level therein, forming continuous flow of the sulfuric acid liquid without presence of a valve or an intermediate tank in a connecting pipe. The heating vessel for distillation is formed in an elongated one with a baffle plate arranged therein to increase the impurity concentration included in concentrated sulfuric acid liquid at an outlet to a high level. In addition, a heater inserted into a heating vessel made of glass is supported at two locations of an inserting portion and a leading portion of the heating vessel formed as a bulged portion, reducing stress concentration to the heater supporting portion due to vibration of the liquid in the heating vessel and vibration of the heating vessel per se.

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Kasugai, Japan

Hiroshi Osuda