Headway Technologies, Incorporated

Hiroshi Omine

Min Li

Kunliang Zhang

Tom Zhong

Jianing Zhou

Ruhang Ding

Systems and methods for controlling a critical dimension (CD) uniformity of a magnetic head device are described. A film stack that is part of a system for controlling a critical dimension (CD) uniformity of a magnetic head device can include a substrate, a magnetoresistive (MR) sensor layer, and a hard mask layer. The system can also include a first mask that defines critical shape patterns other than the CD. The hard mask layer can be patterned using the first mask. The system can also include a second mask that defines the CD. A mandrel pattern can be formed on the hard mask layer using the second mask.

System for controlling a critical dimension (CD) uniformity of a magnetic head device

Methods of critical dimension (CD) uniformity control for magnetic head devices are disclosed. In some embodiments, a method can include providing a film stack, the film stack including a substrate, a magnetoresistive (MR) sensor layer, and a hard mask layer, patterning the hard mask layer using a first mask that defines critical shape patterns other than the CD, forming a mandrel pattern using a second mask that defines the CD, and forming a sidewall spacer pattern on sidewalls of the mandrel pattern, and removing the mandrel pattern.

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Santa Clara, CA, United States of America

Hiroshi Omine