Horiba Stec, Co., Ltd.

Hiroshi Nishizato

Masakazu Minami

Kotaro Takijiri

Yuhei Sakaguchi

Atsuko Teraoka

The present invention provides a gas control system which introduces carrier gas into a tank containing a material and leads out material gas generated by vaporization of the material from the tank together with the carrier gas, the gas control system being provided with: a flow rate control unit that is configure to control the flow rate of the material gas led out from the tank by adjusting the flow rate of the carrier gas introduced into the tank; and a control limit detection unit that is configured to detect a control limit state and output detection of the control limit state, the control limit state is a state that the adjustment of the flow rate of the carrier gas performed by the flow rate control unit cannot secure the flow rate control of the material gas at a predetermined performance level.

Gas control system and film formation apparatus provided with gas control system

In order to provide a fluid control device capable of making the control accuracy of the flow rate or pressure of fluid passing through a valve during each ON interval of pulse control higher than before, the control mechanism includes: a pulse signal generator adapted to input a pulse signal having a predetermined pulse height and a predetermined pulse width to the first valve; a feedback value calculator adapted to, on the basis of a pressure value measured by a pressure sensor, as a feedback value, calculate the time integrated value of a pressure drop occurring in an internal volume during an ON interval when the first valve is opened; and a signal compensator adapted to, on the basis of the deviation between the feedback value and a reference value, compensate the pulse signal to be inputted from the pulse signal generator to the first valve.

Fluid control device, fluid control method, and program recording medium recorded with program for fluid control device

A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.

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Kyoto, Japan

Hiroshi Nishizato