Tokyo Electron Limited

Nhk Spring Co., Ltd.

Hiroshi Narushima

Hiroki Oka

Tsutomu Hiroki

Takehiro Shindo

Keisuke Kondoh

Toru Kimura

Sho Otsuki

A substrate processing apparatus includes a transfer device, having a first pick configured to hold the substrate, configured to transfer a substrate; a detecting device configured to detect a position of the substrate; a susceptor configured to place the substrate thereon; an elevating device configured to move the substrate up and down; and a control device. The control device comprises an adjuster configured to perform a teaching processing; a detector configured to deliver the substrate from the first pick to the susceptor and from the susceptor to the first pick, and configured to detect a first position of the substrate, which is delivered from the susceptor to the first pick, by the detecting device; and a corrector configured to correct the position of the first pick based on a deviation amount between the first position of the substrate and a reference position.

Substrate processing apparatus and transfer position correcting method

A lid apparatus for opening/closing an opening of a main body includes a lid with working and back faces. An arm attaches the lid to the main body to be operable for opening/closing. The arm includes a first axis pivotally supporting the arm on the main body around the opening, and a second axis swingably supporting the back face of the lid on the arm. The second axis is located between the gravity center of the lid and the first axis. A regulatory member intervenes between the arm and the back face of the lid to set the working face of the lid in parallel with the opening.

Vacuum container apparatus used for manufacturing semiconductor devices and lid apparatus for same

Transfer-chamber

Growing community of inventors

Yamanashi, Japan

Hiroshi Narushima