Renesas Electronics Corporation

Mitsubishi Electric Corporation

Hiroshi Mitsuyama

Keiichi Yamada

Kazunobu Miki

Hiroyuki Momono

Kotaro Yajima

Keiko Nishitsuji

Naokazu Terai

Yasuhisa Fujii

Katsuhiro Hasegawa

To provide a more reliable semiconductor device including a lower-cost and more reliable capacitor and a method of manufacturing the same. This manufacturing method comprises the steps of: preparing a semiconductor substrate; and forming, over one of the major surfaces of the semiconductor substrate, a first metal electrode including an aluminum layer, a dielectric layer over the first metal electrode, and a second metal electrode over the dielectric layer. In the step of forming the first metal electrode, the aluminum layer is formed so that the surface thereof satisfies a relationship of Rmax&#x3c;80 nm, Rms&#x3c;10 nm, and Ra&#x3c;9 nm. The step of forming the first metal electrode comprises the steps of: forming at least one first barrier layer; forming the aluminum layer over the first barrier layer; and recrystallizing a crystal constituting the aluminum layer.

Semiconductor device and method of manufacturing the same

A semiconductor package and a semiconductor light-emitting device including the semiconductor package. The semiconductor package includes: a frame for mounting a semiconductor light-emitting element; and a lead integral with the frame. The frame and the lead are made of a resin. A metal film is located in a predetermined area on the frame.

Resin and metal semiconductor device package and semiconductor light-emitting device incorporating the package

Method of manufacturing semiconductor device including forming inter-layer insulating film on semiconductor substrate. First metal film is formed on inter-layer insulating film. First resist is formed on first metal film and patterned. Anisotropic etching performed on first metal film using first resist as mask. First resist is removed and second metal film is formed on inter-layer insulating film to cover remaining first metal film. Second resist is formed on second metal film in area where first metal film exists on inter-layer insulating film and part of area where first metal film does not exist. Anisotropic etching is performed on second metal film using second resist as mask and bonding pad having first metal film and second metal film, and upper layer wiring having second metal film and not first metal film. Second resist is removed. Surface protection film covering bonding pad is formed. Pad opening is formed on bonding pad.

Semiconductor device

Growing community of inventors

Tokyo, Japan

Hiroshi Mitsuyama