S-tec Corporation

Shin-etsu Chemical Co., Ltd.

Hiroshi Mihira

Toshinobu Ishihara

Kazuhiro Hirahara

Tetsuo Shimizu

Masao Yamaguchi

Noriyuki Kimura

Kouichi Ishikawa

Seiki Takaya

A method for vaporizing an organometal compound and supplying the resulting vapor thereof to a crystal growth chamber which comprises the steps of heating an organometal compound to a predetermined temperature to obtain vapor of the compound at a predetermined vapor pressure and supplying, in a constant flow rate, the vapor to the surface of a substrate heated under a reduced pressure: an apparatus for vaporizing an organometal compound and supplying the resulting vapor thereof to a crystal growth chamber 11 comprising a first gas flow path for the vapor of the organometal compound which connects a container 20, in which the organometal compound is charged, to a crystal growth chamber heated under a reduced pressure through a first valve 21, a first massflow controller 22 and a second valve 23 in this order; and a constant temperature oven 24 and 25 for controlling the temperature of the container 20 and the first gas flow path extending from the container 20 to the second valve 23, are herein disclosed. The method and the apparatus makes it possible to form a thin film on substrate having even a large surface area and uniform composition and thickness with good reproducibility and to provide an epitaxial thin film of a compound semiconductor having good sharpness of the crystal growing boundary; the method further makes it possible to prevent the contamination of the solid organometal compound and to provide good workability.

Method for vaporizing and supplying organometal compounds

An apparatus for vaporizing and supplying an organometal compound comprising a gas flow path for starting gas which connects a container filled with the organometal compound to a crystal growth chamber heated under reduced pressure through a main valve, a massflow controller for the starting gas and a valve for supplying the starting gas; and a flow path for a carrier gas which connects a carrier gas source to the discharge outlet of the valve for supplying the starting gas through a massflow controller for carrier gas and a heat exchanger. The container, the flow path for the starting gas and the flow path for the carrier gas are arranged in a constant temperature oven.

Apparatus for vaporizing and supplying organometal compounds

A part of a tube, through which a fluid passes, is cooled by means of an electronic cooling element and a flow rate of the fluid is measured on the basis of a temperature of a surface of the tube cooled. Not only can the flow rate of the liquid flowing through the tube be determined in a noncontacting manner and a very small flow rate of the liquid be determined, but also the tube is cooled so that no bubbles are generated, and thus the measurement of the liquid, which is apt to generate gases, such as low boiling point liquid, is possible. In addition, the measurement is not influenced by the gases dissolved in the liquid and merely the temperature difference resulting from the flow of the fluid, that is, the rise of the temperature of the fluid, is detected to prevent the measurement from being influenced by the installing posture of the flow meter, so that a highly accurate measurement is possible. Consequently, stable and sure controlling flow rate of liquid is possible.

Flow meter for measuring fluid flow with multiple temperature sensors

A part of a tube, through which a fluid passes, is cooled by means of an electronic cooling element and a flow rate of the fluid is measured on the basis of a temperature of a surface of the tube cooled. Not only can the flow rate of the liquid flowing through the tube be determined in a noncontacting manner and a very small flow rate of the liquid be determined, but also the tube is cooled so that no bubbles are generated, and thus the measurment of the liquid, which is apt to generate gases, such as low boiling point liquid, is possible. In addition, the measurement is not influenced by the gases dissolved in the liquid and merely the temperature difference resulting from the flow of the fluid, that is, the rise of the temperature of the fluid, is detected to prevent the measurement from being influenced by the installing posture of the flow meter, so that a highly accurate measurement is possible. Consequently, stable and sure controlling flow rate of liquid is possible.

Growing community of inventors

Kyoto, Japan

Hiroshi Mihira