Wako Pure Chemical Industries, Inc.

Matsushita Electric Industrial Co., Ltd.

Jeol Ltd.

Jeol Technics Co.

Hiroshi Matsuda

Fumiyoshi Urano

Keiji Oono

Masayuki Endo

Satoshi Kobayashi

Michitaka Suzuki

A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.

Process for forming a pattern on a semiconductor substrate using a deep

Deep ultraviolet absorbent composition

An anthracene derivative having at least two groups of the formula: ##STR1## wherein R.sup.1 and R.sup.2 are independently hydrogen, alkyl, alkoxy, etc., is particular effective for forming an antireflection coating for preventing multiple reflection of exposing light from a highly reflective substrate, etc.

Anthracene derivatives

A scanning electron microscope capable of producing an accurate topographical image of a specimen surface irrespective of the elements of the specimen or if the dosage of electron beam varies. The instrument has two detectors arranged in such a way as to detect electron beams reflected from the specimen in two directions which are arranged symmetrically with respect to the normal line to the specimen surface. A subtractor circuit produces the difference between the output signals from the detectors. An adder circuit produces the sum of the output signals from the detectors. A corrective circuit divides the output signal from the subtractor circuit by the output signal from the adder circuit. The output signal from the corrective circuit is integrated by an integrator.

Scanning electron microscope

Growing community of inventors

Kawagoe, Japan

Hiroshi Matsuda