Sharp Kabushiki Kaisha Corporation

Hiroshi Kotaki

Yoshiji Ohta

Seizo Kakimoto

Masatomi Harada

Toshimasa Matsuoka

Nobutoshi Arai

Takayuki Ogura

Syuji Wakaiki

The light emitting device of the invention comprises a first electrode, a second electrode being light transmitting, and a carrier sandwiched between the first electrode and the second electrode and containing light emitters, wherein the first electrode has a plurality of projections or a pn junction formed with a p-type semiconductor and an n-type semiconductor each on a surface being in contact with the carrier.

Light emitting device and method for manufacturing the same

There is provided a semiconductor memory device capable of suppressing writing disturbances without increasing the cell array area. A semiconductor memory device has a memory cell array where a number of memory cells having a two-terminal type memory element and a transistor for selection connected in series are aligned in a matrix shape, a first voltage applying circuit for applying a writing voltage pulse to a first bit line, and a second voltage applying circuit for applying a pre-charge voltage to a first and second bit line, such that at the time of the writing of a memory cell, the first voltage applying circuit pre-charges the two ends of the memory cell to the same voltage in advance, and after that, the second voltage applying circuit applies a writing voltage pulse via the first bit line directly connected to the transistor for selection.

Semiconductor memory device

A method of forming semiconductor devices comprising the steps of forming, by restriction in the increased number of steps by a process close to the normal process, a field effect transistor having a local shallow source/drain diffusion layer on both the sides of a gate electrode for self-matching operation and without etching damages, wherein impurities are ion-implanted onto the semiconductor side wall and onto the substrate surface of both the sides, and thermal treatment operation is effected so as to form the local shallow source/drain diffusing layers by the diffusion for activating the impurities of the deep shallow source drain diffusing layers, thereby to render to be capable of restraining a short channel effect and reducing the parasitic resistance of the semiconductor devices.

Method of forming semiconductor transistor devices

Growing community of inventors

Osaka, Japan

Hiroshi Kotaki