Dai Nippon Printing Co., Ltd.

Tdk Corporation

Kumiai Chemical Industry Co., Ltd.

Exxonmobil Chemical Patents Inc.

Mitsumi Electric Company Ltd.

Keio University

Ihara Chemical Industry Co., Ltd.

Kose Corporation

Eneos Materials Corporation

Arai Seisakusho Co., Ltd

Hiroshi Kawasaki

Katsunari Obata

Toshihiko Takeda

Takeshi Uematsu

Takakazu Imai

Ken Matsuura

Koichiro Miura

Yoshinori Hirobe

Atsushi Maki

Hiroyuki Nishimura

Takeshige Miyazawa

Hiromitsu Ochiai

Yasuko Sone

Osamu Watanabe

Chiaki Hatsuta

Makoto Fujinami

Makoto Mizuno

Eric Paul Jourdain

Toshiaki Yamaguchi

Ryo Hanai

Randal Howard Kerstetter, Iii

Eugene Ronald Uhl

Masatoshi Tamaru

Yasunori Ogawa

Shigeru Maruyama

Toshihiro Ikeuchi

Takumi Yoshimura

Masao Nakatani

Tetsuo Ohkawa

Masayuki Amagai

Eugene R Uhl

Kumiko Hokari

Shuji Ohno

Shotaro Uchizawa

Asako Narita

Miki Ito

Kouichirou Kaku

Kazunori Kobayashi

Eiryo Kawakami

Keita Koseki

Tamotsu Ebihara

Eiji Naru

Toru Atsugi

Yukako Kimura

Hitoshi Ishiro

Ichigen Watanabe

Randal Howard Iii Kerstetter

A flame retardant resin composition comprising: a hydrogenated petroleum resin, being a hydrogenated product of a polymer of an unsaturated hydrocarbon comprising at least one selected from the group consisting of an alicyclic compound having a five-membered ring and an aromatic hydrocarbon compound; a polyolefin; and an inorganic filler.

Flame-resistant resin composition, method for manufacturing same, and hydrogenated petroleum resin

There is provided a vapor deposition mask including: a resin mask including a plurality of resin mask openings corresponding to a pattern to be produced by vapor deposition; and a metal mask including a metal mask opening, the resin mask and the metal mask being stacked such that the resin mask openings overlap with the metal mask opening, wherein a shape of the metal mask opening as the metal mask is seen in plan view includes a polygon as a basic shape and an elongation part, added to the polygon, the elongation part elongating a length of a whole periphery of the polygon.

Vapor deposition mask, method for producing organic semiconductor element, and method for producing organic el display

An estimation method for estimating a parameter related to skin function is provided. The estimation method includes an image acquisition step for acquiring a skin image in which unevenness of a skin surface is captured; an extraction step for extracting a feature vector based on topological information on the skin image from the skin image acquired in the image acquisition step; an estimation step for estimating the parameter related to skin function based on the feature vector extracted in the extraction step, using an estimation model constructed based on past actual measurement data in which feature vectors are associated with the parameter related to skin function; and a presentation step for presenting the parameter related to skin function estimated in the estimation step.

Estimation method, estimation model generation method, program, and estimation device

A vapor deposition mask includes a metal mask and a resin mask having an opening. An inner wall surface for composing the opening has an inflection point in a thicknesswise cross section of the resin mask. When an intersection of a first surface, not facing the metal mask, of the resin mask and the inner wall surface is set to be a first intersection, an intersection of a second surface, facing the metal mask, of the resin mask and the inner wall surface is set to be a second intersection, and there is set a first inflection point first positioned from the first intersection toward the second intersection, an angle formed by a line connecting the first intersection and the first inflection point and the first surface is larger than an angle formed by a line connecting the first inflection point and the second intersection and the second surface.

Vapor deposition mask, frame-equipped vapor deposition mask, and method for producing organic semiconductor element

In a method for producing a vapor deposition mask including a resin maskincluding resin mask openingscorresponding to a pattern to be produced by vapor deposition, and a metal maskincluding a metal mask opening, the metal mask being stacked on one surface of the resin mask, when the plurality of resin mask openingsare formed, as to any one resin mask openingof the plurality of resin mask openings, the resin mask openingis formed such that in a thicknesswise cross section of the resin mask, an acute angle (&#x3b8;) formed by one inner wall surface forming the one resin mask opening and the other surface of the resin mask is different from an acute angle (&#x3b8;) formed by the other inner wall surface forming the one resin mask opening and the other surface of the resin mask.

Method for producing vapor deposition mask, method for producing organic semiconductor element, and method for producing organic EL display

There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal maskin which a slitis provided and a resin maskin which openingscorresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slitare stacked, and the metal maskhas a general regionin which the slitis provided and a thick regionlarger in thickness than the general region.

Vapor deposition mask, vapor deposition mask preparation body, method for producing vapor deposition mask, and method for producing organic semiconductor element

A vapor deposition mask capable of correctly performing confirmation of whether a shape pattern of openings formed in a resin mask is normal or similar confirmation while satisfying both high definition and lightweight, a vapor deposition mask preparation body for obtaining the vapor deposition mask, a frame-equipped vapor deposition mask including the vapor deposition mask, and a method for producing an organic semiconductor element using the frame-equipped vapor deposition mask. The aforementioned problem is solved by using, in a vapor deposition mask including a metal mask in which a through hole is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the through hole, the metal mask and the resin mask being stacked, wherein the resin mask has about 40% or less of light ray transmittance at a wavelength of about 550 nm.

Vapor deposition mask, frame-equipped vapor deposition mask, vapor deposition mask preparation body, and method for producing organic semiconductor element

A vapor deposition mask includes: a metal mask in which a metal mask opening is provided; and a resin mask in which a resin mask opening corresponding to a pattern to be produced by vapor deposition is provided at a position overlapping with the metal mask opening, the metal mask and the resin mask being stacked, wherein an arithmetic average height (Sa) of a surface of the resin mask exposed from the metal mask opening is not more than 0.8 &#x3bc;m.

Vapor deposition mask, frame-equipped vapor deposition mask, vapor deposition mask preparation body, vapor deposition pattern forming method, and method for producing organic semiconductor element

A vapor deposition mask capable of correctly performing confirmation of whether a shape pattern of openings formed in a resin mask is normal or similar confirmation while satisfying both high definition and lightweight, a vapor deposition mask preparation body for obtaining the vapor deposition mask, a frame-equipped vapor deposition mask including the vapor deposition mask, and a method for producing an organic semiconductor element using the frame-equipped vapor deposition mask. The aforementioned problem is solved by using, in a vapor deposition mask including a metal mask in which a slit is formed and a resin mask in which an opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the slit, the metal mask and the resin mask being stacked, the resin mask which has about 40% or less of light ray transmittance at a wavelength of about 550 nm.

Provided are compositions comprising: (i) a dispersed phase of rubber that is at least partially cured; (ii) a continuous thermoplastic phase including at least one thermoplastic polymer; (iii) a first polysiloxane having a number average molecular weight greater than 100 kg/mole; and (iv) a second polysiloxane having a number average molecular weight less than 100 kg/mole, and methods for making such compositions. Also provided are laminates including such compositions, weatherseals made therefrom, and methods for making them.

Compositions and methods for making them

Growing community of inventors

Tokyo, Japan

Hiroshi Kawasaki