Fuji Photo Film Company, Limited

Kabushiki Kaisha Toshiba

Fuji Xerox Co., Ltd.

Fujifilm Corporation

Other

Fujifilm Business Innovation Corp.

Toshiba Memory Corporation

Nisca Corporation

Kanto Kagaku Kabushiki Kaisha

Hiroshi Kawamoto

Hisashi Okamura

Morio Yagihara

Masakazu Morigaki

Shigeru Nakamura

Makoto Kikuchi

Shigeo Hirano

Yoshihiro Fujita

Keizo Kimura

Mikie Miyasato

Hiroyuki Watanabe

Hiroshi Amano

Yoshihiro Uozumi

Tsuyoshi Matsumura

Takahito Nakajima

Kiminobu Tsutada

Riwako Miyauchi

Tomohiro Ueno

Masato Minagawa

Yoshihiro Ogawa

Hideki Kimura

Hiroki Sasaki

Akihiro Yamada

Naoto Miyashita

Koji Kimura

Yuichi Nakashima

Kazuhisa Mochizuki

Ichiro Katakabe

Hidekazu Yamagiwa

Hajime Onoda

Takeshi Takahashi

Kazunobu Katoh

Ken Kawata

Toshiki Taguchi

Nobutaka Fukagawa

Masato Satomura

Taku Nakamura

Terukazu Yanagi

Tadashi Inaba

Ichizo Toya

Masanobu Takashima

Minoru Yamada

Shunji Takada

Hiroshi Takeuchi

Yoshihisa Tsukada

Norio Ishikawa

Hiroshi Kitaguchi

Yoichi Maruyama

Masayuki Negoro

Minori Kajimoto

Sumito Yamada

Hisashi Shiraishi

Kazuhiko Matsumoto

Koichi Matsuno

Tamio Mizukami

Takashi Toyoda

Tatsuya Tamaoki

Yoshiyuki Yonetani

Yoichi Suga

Naoki Asanuma

Shuzo Suga

Saisuke Watanabe

Ryo Nishio

Hiroshi Kawasaki

Yoshio Sakakibara

Masatoshi Nakanishi

Shun-ichi Ikeda

Minoru Uchida

Takuo Oowada

Ikuko Ohgaru

Naoki Kai

Kenji Doi

Yuko Saito

Mikizo Kuwabara

Tsuyoshi Okuda

Yuko Kanda

A medium transport device includes a medium guide member, a driving source, a first movement member, a movement restricting member, and a second moving member. The medium guide member is movable between a first guide position, in which the medium guide member guides a medium toward a receiving member on which the medium is loaded, and a second guide position, in which the medium guide member guides the medium from the receiving member into the device. The driving source moves the medium guide member. The first movement member moves the medium guide member in accordance with an operation of the driving source. The movement restricting member is movable together with the medium guide member. The second moving member is movable between a first position, in which the second moving member is located close to the movement restricting member to restrict the medium guide member from moving from the second guide position to the first guide position, and a second position, in which the second moving member is spaced apart from the movement restricting member to allow the medium guide member to move to the first guide position. The second moving member moves from the first position to the second position when the medium guide member moves toward the first guide position in response to an operation of the driving source.

Medium transport device and image forming apparatus

A medium transport device includes a transporting member, a medium offsetting member, a guide member, and an interlocking member. The guide member is located upstream of the transporting member in a medium transport direction. The guide member is movable between a first position, in which the guide member guides the medium toward the medium accommodating member, and a second position, in which the guide member guides the medium to a destination different from the medium accommodating member, to guide the medium. The interlocking member moves the guide member between the first position and the second position in conjunction with a movement of the medium offsetting member in a width direction of the medium offsetting member.

A medium transport device includes a transporting member that transports a medium toward a medium accommodating member; a switching member that switches between a first guide position, in which the switching member guides the medium to be transported to the medium accommodating member, and a second guide position, in which the switching member guides the medium to be transported to a position different from the medium accommodating member, the switching member being movable between a first shift position and a second shift position in a width direction of the medium; and a movement member that moves the switching member to the first guide position to move the switching member to the first shift position, and that moves the switching member to the second guide position to move the switching member to the second shift position.

A cleaning apparatus for a semiconductor substrate includes a belt conveyor, a treatment head that executes cleaning, rinsing and drying treatments, a rinse water supplying mechanism that supplies rinse water adjusted to a predetermined pH value to the treatment head and configured to rinse the substrate applies heat to the rinse water to set a rinse water temperature to 70&#xb0; or above, and an optical mechanism. The treatment head is configured to rinse the substrate. The optical mechanism is configured to recognize a pattern on the semiconductor substrate so that the semiconductor substrate can be automatically placed on the belt conveyor with a direction of the recognized pattern and a feeding direction of the belt conveyor having a predetermined relationship. The treatment head includes a drying treatment mechanism configured to execute both a drying treatment with use of drying solvent and lamp annealing in execution of drying treatment.

Apparatus and method for cleaning semiconductor substrate

An image forming apparatus includes an output unit that transports and outputs a recording medium on which an image has been formed, a member having an opening through which the recording medium is output, and a shield member disposed at the opening, the shield member shielding the output unit. The shield member includes plural swing members and a shield plate. The swing members are swingably supported and arranged in an axial direction of the output unit. The shield plate is attached to a wall that restrains the recording medium that is output from returning toward the output unit.

Image forming apparatus

A composition comprising at least one compound represented by the following formula (Z) is disclose.A-L-{D-(E)-D-(B)&#x2014;Z&#x2014;R}&#x2003;&#x2003;(Z) In the formula, A represents a p-valent, linear or cyclic residue; L represents a single bond or a divalent linking group; p indicates an integer of at least 2; Drepresents a carbonyl group (&#x2014;C(&#x2550;O)&#x2014;) or a sulfonyl group (&#x2014;S(&#x2550;O)&#x2014;); Drepresents a carbonyl group (&#x2014;C(&#x2550;O)&#x2014;), a sulfonyl group (&#x2014;S(&#x2550;O)&#x2014;), a carboxyl group (&#x2014;C(&#x2550;O)O&#x2014;), a sulfoxyl group (&#x2014;S(&#x2550;O)O&#x2014;), a carbamoyl group (&#x2014;C(&#x2550;O)N(Alk)-), or a sulfamoyl group (&#x2014;S(&#x2550;O)N(Alk)-); E represents a divalent group; R represents a hydrogen atom, or a substituted or unsubstituted alkyl group having at most 7 carbon atoms; B represents oxyethylene group or the like; Zrepresents a single bond, or a divalent group.

Composition, compound and film forming method

An image forming apparatus includes an image forming unit that forms an image on a recording medium, an output unit that outputs the recording medium on which the image has been formed while providing the recording medium with a wave-like shape in a direction that is substantially perpendicular to a transport direction of the recording medium, and a member having an opening through which the recording medium is output. The opening has a shape corresponding to the wave-like shape of the recording medium provided by the output unit.

A semiconductor substrate cleaning method includes cleaning a semiconductor substrate formed with a line-and-space pattern, rinsing the substrate, supplying the rinse water to rinse the substrate, and drying the substrate. The rinsing includes supplying deionized water and hydrochloric acid into a mixing section to mix the deionized water and the hydrochloric acid into a mixture, heating the mixture in the mixing section by a heater, detecting a pH value and a temperature of the mixture by a pH sensor and a temperature sensor respectively, adjusting an amount of hydrochloric acid supplied into the mixing section so that the rinse water has a predetermined pH value indicative of acidity, and energizing or de-energizing the heater so that the temperature of the mixture detected by the temperature sensor reaches a predetermined temperature, thereby producing the rinse water which has a temperature of not less than 70&#xb0; C. and is acidic.

A lubricant composition comprising following ingredients (a) and (b) is disclosed. 

Lubricant composition, mechanical element, and method for producing triazine derivatives

A photoresist residue remover composition is provided that removes a photoresist residue formed by a resist ashing treatment after dry etching in a step of forming, on a substrate surface, wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the composition including one or two or more types of inorganic acid and one or two or more types of inorganic fluorine compound. There is also provided a process for producing a semiconductor circuit element wherein, in a step of forming wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the photoresist residue remover composition is used for removing a photoresist residue formed by a resist ashing treatment after dry etching.

Photoresist residue remover composition and semiconductor circuit element production process employing the same

An optical film, which contains a cellulose acylate, at least one compound of formula (I) in an amount of 0.01 to 20 mass parts, and at least one cyclic compound having at least three substituents in an amount of 0.01 to 20 mass parts, to 100 mass parts of the cellulose acylate: 

Optical film, optical compensation sheet, polarizing plate, and liquid crystal display device

A method of fabricating a semiconductor device includes applying a coating oxide film to a surface of a substrate including a semiconductor substrate so that a recess formed in the surface is filled with the coating oxide film, applying a steam oxidation treatment to the substrate at a first temperature, soaking the substrate in heated water while applying a megasonic wave to the substrate in the heated water, and applying a steam oxidation treatment to the substrate at a second temperature higher than the first temperature.

Method of fabricating semiconductor memory device in which an oxide film fills a trench in a semiconductor substrate

An insulating tube includes a underlying insulating film, a first sidewall insulating film disposed on the underlying insulating film, a second sidewall insulating film disposed on the underlying insulating film, opposite to the first sidewall insulating film so as to provide a cavity between the first and second sidewall insulating films having the same height as the first sidewall insulating film, and an upper insulating film provided over the first and second sidewall insulating films.

Insulating tube, semiconductor device employing the tube, and method of manufacturing the same

Insulating tube

Growing community of inventors

Kanagawa, Japan

Hiroshi Kawamoto