Pi R&d Co., Ltd.

National Institute of Advanced Industrial Science and Technology

Other

Yokohama Tlo Company, Ltd.

Hiroshi Itatani

Shunichi Matsumoto

Masahiro Aoyagi

Hiroshi Nakagawa

Katsuya Kikuchi

Kazuhiko Tokoro

Sigemasa Segawa

Takafumi Fukushima

Tarou Itatani

Sucheta Gorwadkar

Tsunenori Sakamoto

Masanori Komuro

Masao Tomoi

H Nakagawa

Disclosed is a composition of a negative-type photosensitive polyimide which is solvent soluble, which is excellent in adhesiveness, heat resistance, mechanical properties and in flexibility, which shows characteristics of alkali-soluble highly sensitive negative-type photoresist upon irradiation with light, The composition according to the present invention comprises a photo radical initiator and a solvent-soluble polyimide which shows negative-type photosensitivity in the presence of the photo radical initiator.

Negative photosensitive polyimide composition and method for forming image the same

The invention relates to a reaction development patterning process wherein a photo resist layer masked by a desired pattern is irradiated using ultraviolet light and this layer is subsequently washed using a solvent solution containing alkali characterized by said photo resist layer comprising a condensation type polymer containing in the main chain carbonyl groups (C&#x2550;O) bonded to hetero atoms and a photo acid generating agent and said alkali being an amine. This reaction development patterning process is characterized by being able to use as a photo resist target resins containing bonds having low reactivity toward nucleophilic reagents, for example, condensation type polymers containing any one of bonds such as carbonate, ester, urethane and amide.

Method for forming image through reaction development

A superconducting integrated circuit includes a substrate, a multilayer structure formed on the substrate and composed of a lower superconducting electrode, a tunnel barrier and an upper superconducting electrode sequentially joined together upward in the order mentioned, and an insulating layer perforated to form via holes to get electrical contacts with the lower and upper electrodes. The insulating layer is formed of a high-resolution, photosensitive, solvent-soluble, organic insulating material. The superconducting integrated circuit is produced by a method that includes the steps of depositing the multiplayer on the substrate, applying the insulating material to the front surface of the substrate inclusive of the multiplayer, forming the via holes in the insulating material by the lithographic technique at the prospective positions to get electrical contacts with the upper and lower electrodes, and laying wirings for connecting the upper and lower electrodes through the via holes.

Superconducting integrated circuit and method for fabrication thereof

A polyimide-based polycondensate which may be used as an insulation film by coating a copper foil with the polycondensate and by heating the coated copper foil, which insulation film does not warp the foil, as well as a production process thereof, is disclosed. The polycondensate according to the invention is a solvent-soluble polycondensate containing a benzoxazole component having a carboxylic group and an imide component having a phenolic hydroxyl group, which is obtained by dehydration-condensing one or more tetracarboxylic dianhydrides with one or more aromatic diamines having an amino group and a phenolic hydroxyl group, the amino group and the phenolic hydroxyl group being located at ortho positions with respect to each other, by heating the one or more tetracarboxylic dianhydrides and the one or more aromatic diamines at 150&#xb0; C. to 220&#xb0; C. in the presence of an acid catalyst.

Imide-benzoxazole polycondensate and process for producing the same

This invention relates to a photosensitive polyimide material having positive-type or negative-type photosensitivity, which may be developed with a high resolution with an irradiation energy having short wavelength such as ultraviolet light or electron beam. The positive-type photosensitive polyimide composition comprising a solvent-soluble polyimide which shows positive-type photosensitivity in the presence of a photoacid generator, which is obtained by polycondensation of at least one aliphatic tetracarboxylic dianhydride and/or alicyclic tetracarboxylic dianhydride and at least one aliphatic diamine and/or alicyclic diamine and/or diaminosiloxane; and the photoacid generator. Since the polyimide has negative-type photosensitivity when irradiated with electron beam in the absence of a photoacid generator, a method for forming negative-type polyimide pattern using the polyimide is also provided.

Method for forming polyimide pattern using photosensitive polyimide and composition for use therein

A composition for electro-depositing polyimide membranes which can be patterned by photolithography, which are excellent in heat resistance, insulation performance and in chemical resistance. The composition for electrodeposition of polyimides according to the present invention comprises a composition for electrodeposition of polyimides comprising a photoacid generator, a positive-type photosensitive polyimide having oxycarbonyl groups in side chains, a polar solvent which dissolves said polyimide, water, a dispersing agent, and an alkaline neutralizer.

Composition for electrodeposition of polyimides and method for producing patterned polyimide membranes using the same

A photosensitive polyimide composition which is soluble in an organic solvent, which is excellent in adhesiveness, heat resistance, mechanical properties and flexibility, which shows the property of highly sensitive positive-type photoresist that is soluble in alkali upon irradiation with light is disclosed. The polyimide composition of the present invention contains a photoacid generator and a solvent-soluble polyimide which shows positive-type photosensitivity in the presence of said photoacid generator.

Positive photosensitive poliymide composition

A composite film having an excellent heat resistance is disclosed. The composite film according to the present invention comprises a substrate film and polyimide membrane(s) formed on at least one surface of the substrate film, which polyimide membrane(s) is(are) prepared by applying a solution of a solvent-soluble polyimide whose main chain is formed by polycondensation of one or more tetracarboxylic dianhydrides and one or more diamines and by drying the solution. The solvent-soluble polyimide comprises bicyclo(2,2,2)oct-7-ene-2,3,5,6-tetracarboxylic dianhydride as at least a part of the tetracarboxylic dianhydride(s) and/or at least one of 3,5-diaminobenzoic acid and a diaminosiloxane derivative as at least a part the diamine(s).

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Yokohama, Japan

Hiroshi Itatani